JPH0534837B2 - - Google Patents
Info
- Publication number
- JPH0534837B2 JPH0534837B2 JP58081124A JP8112483A JPH0534837B2 JP H0534837 B2 JPH0534837 B2 JP H0534837B2 JP 58081124 A JP58081124 A JP 58081124A JP 8112483 A JP8112483 A JP 8112483A JP H0534837 B2 JPH0534837 B2 JP H0534837B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- polycrystalline silicon
- thin film
- thickness
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58081124A JPS59205761A (ja) | 1983-05-10 | 1983-05-10 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58081124A JPS59205761A (ja) | 1983-05-10 | 1983-05-10 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59205761A JPS59205761A (ja) | 1984-11-21 |
| JPH0534837B2 true JPH0534837B2 (cs) | 1993-05-25 |
Family
ID=13737637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58081124A Granted JPS59205761A (ja) | 1983-05-10 | 1983-05-10 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59205761A (cs) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60136260A (ja) * | 1983-12-24 | 1985-07-19 | Sony Corp | 電界効果型トランジスタの製造方法 |
| JPH07120805B2 (ja) * | 1987-10-12 | 1995-12-20 | 日本電気株式会社 | 半導体装置およびその製造方法 |
| US6337232B1 (en) | 1995-06-07 | 2002-01-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabrication of a crystalline silicon thin film semiconductor with a thin channel region |
| US7050878B2 (en) | 2001-11-22 | 2006-05-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductror fabricating apparatus |
| US7133737B2 (en) | 2001-11-30 | 2006-11-07 | Semiconductor Energy Laboratory Co., Ltd. | Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer |
| TWI267145B (en) | 2001-11-30 | 2006-11-21 | Semiconductor Energy Lab | Manufacturing method for a semiconductor device |
| US7214573B2 (en) | 2001-12-11 | 2007-05-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device that includes patterning sub-islands |
| JP3992976B2 (ja) | 2001-12-21 | 2007-10-17 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP4030758B2 (ja) | 2001-12-28 | 2008-01-09 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891678A (ja) * | 1981-11-27 | 1983-05-31 | Nec Corp | 半導体装置およびその製造方法 |
-
1983
- 1983-05-10 JP JP58081124A patent/JPS59205761A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59205761A (ja) | 1984-11-21 |
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