JPH0529129B2 - - Google Patents

Info

Publication number
JPH0529129B2
JPH0529129B2 JP61275976A JP27597686A JPH0529129B2 JP H0529129 B2 JPH0529129 B2 JP H0529129B2 JP 61275976 A JP61275976 A JP 61275976A JP 27597686 A JP27597686 A JP 27597686A JP H0529129 B2 JPH0529129 B2 JP H0529129B2
Authority
JP
Japan
Prior art keywords
substrate
scanning
distortion
exposure
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61275976A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63128713A (ja
Inventor
Masaki Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61275976A priority Critical patent/JPS63128713A/ja
Publication of JPS63128713A publication Critical patent/JPS63128713A/ja
Publication of JPH0529129B2 publication Critical patent/JPH0529129B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61275976A 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法 Granted JPS63128713A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61275976A JPS63128713A (ja) 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61275976A JPS63128713A (ja) 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法

Publications (2)

Publication Number Publication Date
JPS63128713A JPS63128713A (ja) 1988-06-01
JPH0529129B2 true JPH0529129B2 (enrdf_load_stackoverflow) 1993-04-28

Family

ID=17563043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61275976A Granted JPS63128713A (ja) 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法

Country Status (1)

Country Link
JP (1) JPS63128713A (enrdf_load_stackoverflow)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0752712B2 (ja) * 1989-12-27 1995-06-05 株式会社東芝 露光装置
JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5477304A (en) 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
USRE38113E1 (en) 1993-04-02 2003-05-06 Nikon Corporation Method of driving mask stage and method of mask alignment
US6753948B2 (en) 1993-04-27 2004-06-22 Nikon Corporation Scanning exposure method and apparatus
US5854671A (en) 1993-05-28 1998-12-29 Nikon Corporation Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3477838B2 (ja) 1993-11-11 2003-12-10 株式会社ニコン 走査型露光装置及び露光方法
USRE37762E1 (en) 1994-04-12 2002-06-25 Nikon Corporation Scanning exposure apparatus and exposure method
US6721034B1 (en) 1994-06-16 2004-04-13 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US5850280A (en) 1994-06-16 1998-12-15 Nikon Corporation Stage unit, drive table, and scanning exposure and apparatus using same
JP3484684B2 (ja) * 1994-11-01 2004-01-06 株式会社ニコン ステージ装置及び走査型露光装置
US6235438B1 (en) 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
TW396395B (en) 1998-01-07 2000-07-01 Nikon Corp Exposure method and scanning-type aligner
KR101163435B1 (ko) 2003-04-09 2012-07-13 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI457712B (zh) 2003-10-28 2014-10-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR101455551B1 (ko) 2005-05-12 2014-10-27 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
US4549084A (en) * 1982-12-21 1985-10-22 The Perkin-Elmer Corporation Alignment and focusing system for a scanning mask aligner
JPS60182444A (ja) * 1984-03-01 1985-09-18 Canon Inc 半導体露光装置
JPS6125102A (ja) * 1984-07-16 1986-02-04 Akai Electric Co Ltd 光学膜形成方法
JPS61247026A (ja) * 1985-04-25 1986-11-04 Canon Inc 露光装置
JPS61251025A (ja) * 1985-04-30 1986-11-08 Canon Inc 投影露光装置
JPH0732111B2 (ja) * 1985-06-10 1995-04-10 日本電信電話株式会社 荷電ビ−ム投影露光装置

Also Published As

Publication number Publication date
JPS63128713A (ja) 1988-06-01

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