JPS63128713A - 走査型露光装置のデイスト−シヨン補正方法 - Google Patents

走査型露光装置のデイスト−シヨン補正方法

Info

Publication number
JPS63128713A
JPS63128713A JP61275976A JP27597686A JPS63128713A JP S63128713 A JPS63128713 A JP S63128713A JP 61275976 A JP61275976 A JP 61275976A JP 27597686 A JP27597686 A JP 27597686A JP S63128713 A JPS63128713 A JP S63128713A
Authority
JP
Japan
Prior art keywords
scanning
substrate
exposure
mask
distortion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61275976A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0529129B2 (enrdf_load_stackoverflow
Inventor
Masaki Suzuki
正樹 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61275976A priority Critical patent/JPS63128713A/ja
Publication of JPS63128713A publication Critical patent/JPS63128713A/ja
Publication of JPH0529129B2 publication Critical patent/JPH0529129B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61275976A 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法 Granted JPS63128713A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61275976A JPS63128713A (ja) 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61275976A JPS63128713A (ja) 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法

Publications (2)

Publication Number Publication Date
JPS63128713A true JPS63128713A (ja) 1988-06-01
JPH0529129B2 JPH0529129B2 (enrdf_load_stackoverflow) 1993-04-28

Family

ID=17563043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61275976A Granted JPS63128713A (ja) 1986-11-19 1986-11-19 走査型露光装置のデイスト−シヨン補正方法

Country Status (1)

Country Link
JP (1) JPS63128713A (enrdf_load_stackoverflow)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198319A (ja) * 1989-12-27 1991-08-29 Toshiba Corp 露光装置
US6124923A (en) * 1994-11-01 2000-09-26 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US6211946B1 (en) 1994-06-16 2001-04-03 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US6235438B1 (en) 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
USRE37361E1 (en) 1993-11-11 2001-09-11 Nikon Corporation Scanning type exposure apparatus and exposure method
USRE37762E1 (en) 1994-04-12 2002-06-25 Nikon Corporation Scanning exposure apparatus and exposure method
US6437354B1 (en) 1998-01-07 2002-08-20 Nikon Corporation Exposure method and scanning-type exposure apparatus
US6462807B1 (en) 1993-05-28 2002-10-08 Nikon Corporation Projection exposure apparatus and method
USRE37913E1 (en) 1991-03-06 2002-11-26 Nikon Corporation Exposure method and projection exposure apparatus
US6556278B1 (en) 1993-06-30 2003-04-29 Nikon Corporation Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
USRE38113E1 (en) 1993-04-02 2003-05-06 Nikon Corporation Method of driving mask stage and method of mask alignment
US6721034B1 (en) 1994-06-16 2004-04-13 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US6753948B2 (en) 1993-04-27 2004-06-22 Nikon Corporation Scanning exposure method and apparatus
USRE38798E1 (en) 1992-10-22 2005-09-20 Nikon Corporation Projection exposure apparatus
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS59132621A (ja) * 1982-12-21 1984-07-30 エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド 走査マスクアライナ用の位置合せ系及び焦点調節系
JPS60182444A (ja) * 1984-03-01 1985-09-18 Canon Inc 半導体露光装置
JPS6125102A (ja) * 1984-07-16 1986-02-04 Akai Electric Co Ltd 光学膜形成方法
JPS61247026A (ja) * 1985-04-25 1986-11-04 Canon Inc 露光装置
JPS61251025A (ja) * 1985-04-30 1986-11-08 Canon Inc 投影露光装置
JPS61283121A (ja) * 1985-06-10 1986-12-13 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム投影露光装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS59132621A (ja) * 1982-12-21 1984-07-30 エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド 走査マスクアライナ用の位置合せ系及び焦点調節系
JPS60182444A (ja) * 1984-03-01 1985-09-18 Canon Inc 半導体露光装置
JPS6125102A (ja) * 1984-07-16 1986-02-04 Akai Electric Co Ltd 光学膜形成方法
JPS61247026A (ja) * 1985-04-25 1986-11-04 Canon Inc 露光装置
JPS61251025A (ja) * 1985-04-30 1986-11-08 Canon Inc 投影露光装置
JPS61283121A (ja) * 1985-06-10 1986-12-13 Nippon Telegr & Teleph Corp <Ntt> 荷電ビ−ム投影露光装置

Cited By (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198319A (ja) * 1989-12-27 1991-08-29 Toshiba Corp 露光装置
USRE37913E1 (en) 1991-03-06 2002-11-26 Nikon Corporation Exposure method and projection exposure apparatus
USRE38085E1 (en) 1991-03-06 2003-04-22 Nikon Corporation Exposure method and projection exposure apparatus
USRE38038E1 (en) 1991-03-06 2003-03-18 Nikon Corporation Exposure method and projection exposure apparatus
USRE37946E1 (en) 1991-03-06 2002-12-31 Nikon Corporation Exposure method and projection exposure apparatus
USRE39083E1 (en) 1992-10-22 2006-05-02 Nikon Corporation Projection exposure apparatus
USRE38798E1 (en) 1992-10-22 2005-09-20 Nikon Corporation Projection exposure apparatus
USRE38113E1 (en) 1993-04-02 2003-05-06 Nikon Corporation Method of driving mask stage and method of mask alignment
US6753948B2 (en) 1993-04-27 2004-06-22 Nikon Corporation Scanning exposure method and apparatus
US6462807B1 (en) 1993-05-28 2002-10-08 Nikon Corporation Projection exposure apparatus and method
US6707536B2 (en) 1993-05-28 2004-03-16 Nikon Corporation Projection exposure apparatus
US6900879B2 (en) 1993-05-28 2005-05-31 Nikon Corporation Projection exposure apparatus
US6795169B2 (en) 1993-06-30 2004-09-21 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US7088425B2 (en) 1993-06-30 2006-08-08 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US7023527B2 (en) 1993-06-30 2006-04-04 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6556278B1 (en) 1993-06-30 2003-04-29 Nikon Corporation Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
USRE37361E1 (en) 1993-11-11 2001-09-11 Nikon Corporation Scanning type exposure apparatus and exposure method
USRE37762E1 (en) 1994-04-12 2002-06-25 Nikon Corporation Scanning exposure apparatus and exposure method
US7202936B2 (en) 1994-06-16 2007-04-10 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using same
US6211946B1 (en) 1994-06-16 2001-04-03 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US6721034B1 (en) 1994-06-16 2004-04-13 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US6124923A (en) * 1994-11-01 2000-09-26 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US6262797B1 (en) * 1994-11-01 2001-07-17 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US6235438B1 (en) 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
US6437354B1 (en) 1998-01-07 2002-08-20 Nikon Corporation Exposure method and scanning-type exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
JPH0529129B2 (enrdf_load_stackoverflow) 1993-04-28

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