JPH0527938B2 - - Google Patents
Info
- Publication number
- JPH0527938B2 JPH0527938B2 JP60059853A JP5985385A JPH0527938B2 JP H0527938 B2 JPH0527938 B2 JP H0527938B2 JP 60059853 A JP60059853 A JP 60059853A JP 5985385 A JP5985385 A JP 5985385A JP H0527938 B2 JPH0527938 B2 JP H0527938B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- analysis
- point
- analysis point
- analyzed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004458 analytical method Methods 0.000 claims description 87
- 238000010884 ion-beam technique Methods 0.000 claims description 16
- 150000002500 ions Chemical class 0.000 claims description 14
- 238000004949 mass spectrometry Methods 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000011953 bioanalysis Methods 0.000 description 1
- 230000004397 blinking Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60059853A JPS61218057A (ja) | 1985-03-25 | 1985-03-25 | イオンマイクロアナライザ− |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60059853A JPS61218057A (ja) | 1985-03-25 | 1985-03-25 | イオンマイクロアナライザ− |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61218057A JPS61218057A (ja) | 1986-09-27 |
JPH0527938B2 true JPH0527938B2 (zh) | 1993-04-22 |
Family
ID=13125164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60059853A Granted JPS61218057A (ja) | 1985-03-25 | 1985-03-25 | イオンマイクロアナライザ− |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61218057A (zh) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5292786A (en) * | 1976-01-30 | 1977-08-04 | Hitachi Ltd | Ion microanalyzer |
JPS5328488A (en) * | 1976-08-30 | 1978-03-16 | Hitachi Ltd | Specimen analyzer |
JPS5875749A (ja) * | 1981-10-30 | 1983-05-07 | Shimadzu Corp | 荷電粒子線分析装置の試料位置表示装置 |
-
1985
- 1985-03-25 JP JP60059853A patent/JPS61218057A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5292786A (en) * | 1976-01-30 | 1977-08-04 | Hitachi Ltd | Ion microanalyzer |
JPS5328488A (en) * | 1976-08-30 | 1978-03-16 | Hitachi Ltd | Specimen analyzer |
JPS5875749A (ja) * | 1981-10-30 | 1983-05-07 | Shimadzu Corp | 荷電粒子線分析装置の試料位置表示装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS61218057A (ja) | 1986-09-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104795302B (zh) | 具有用于横切应用的过程自动化的图案识别的差分成像 | |
US7129727B2 (en) | Defect inspecting apparatus | |
CN104364877A (zh) | 带电粒子束装置 | |
JPH02123749A (ja) | 断面加工観察装置 | |
JP3624721B2 (ja) | プローブ装置 | |
JP5078232B2 (ja) | 複合荷電粒子ビーム装置及びそれにおける照射位置決め方法 | |
JPH1027833A (ja) | 異物分析方法 | |
WO2017033591A1 (ja) | 荷電粒子線装置および試料ステージのアライメント調整方法 | |
JPH0562638A (ja) | 集束イオンビーム装置 | |
DE60015859T2 (de) | Raster-Ladungsträgerstrahlgerät und Verfahren zur Beobachtung von Probenbildern mittels einem solchen Gerät | |
US8901494B2 (en) | Sample analyzer | |
JPH0527938B2 (zh) | ||
JP2611260B2 (ja) | 試料像表示装置 | |
JP2716997B2 (ja) | 断面形状測定法及び断面形状比較検査法並びにそれらの装置 | |
US5895916A (en) | Method and apparatus for adjusting electron beam apparatus | |
JP2013114881A (ja) | 試料解析装置 | |
JPH08124510A (ja) | 分析装置の試料ステージ駆動装置 | |
JPH10260145A (ja) | エネルギー分散型x線マイクロアナライザ | |
JPS58112341A (ja) | 集積回路解析装置 | |
KR830002115B1 (ko) | 입자선을 사용한 시료분석 장치 | |
JPH0479140A (ja) | 荷電粒子ビーム装置及びその画像処理方法 | |
JP2006331852A (ja) | 表面観察分析装置 | |
JPH0634582A (ja) | 電子線マイクロアナライザ | |
JPH1083782A (ja) | 走査電子顕微鏡 | |
JPH03165437A (ja) | 表面分析装置 |