JPH0524615B2 - - Google Patents

Info

Publication number
JPH0524615B2
JPH0524615B2 JP58088681A JP8868183A JPH0524615B2 JP H0524615 B2 JPH0524615 B2 JP H0524615B2 JP 58088681 A JP58088681 A JP 58088681A JP 8868183 A JP8868183 A JP 8868183A JP H0524615 B2 JPH0524615 B2 JP H0524615B2
Authority
JP
Japan
Prior art keywords
pixels
displayed
sample
irradiation
irradiation point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58088681A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59214151A (ja
Inventor
Masayuki Taira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP58088681A priority Critical patent/JPS59214151A/ja
Publication of JPS59214151A publication Critical patent/JPS59214151A/ja
Publication of JPH0524615B2 publication Critical patent/JPH0524615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical or photographic arrangements associated with the tube

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP58088681A 1983-05-20 1983-05-20 荷電粒子線装置等における二次元画像デ−タの表示方法 Granted JPS59214151A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58088681A JPS59214151A (ja) 1983-05-20 1983-05-20 荷電粒子線装置等における二次元画像デ−タの表示方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58088681A JPS59214151A (ja) 1983-05-20 1983-05-20 荷電粒子線装置等における二次元画像デ−タの表示方法

Publications (2)

Publication Number Publication Date
JPS59214151A JPS59214151A (ja) 1984-12-04
JPH0524615B2 true JPH0524615B2 (nl) 1993-04-08

Family

ID=13949568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58088681A Granted JPS59214151A (ja) 1983-05-20 1983-05-20 荷電粒子線装置等における二次元画像デ−タの表示方法

Country Status (1)

Country Link
JP (1) JPS59214151A (nl)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638329B2 (ja) * 1986-12-29 1994-05-18 セイコー電子工業株式会社 集束イオンビーム走査方法
JP2007003535A (ja) * 2001-08-29 2007-01-11 Hitachi Ltd 試料寸法測定方法及び走査型電子顕微鏡
IL156419A0 (en) * 2001-08-29 2004-01-04 Hitachi Ltd Sample dimension measuring method and scanning electron microscope
JP2006138864A (ja) * 2001-08-29 2006-06-01 Hitachi Ltd 試料寸法測定方法及び走査型電子顕微鏡
WO2003067652A1 (en) * 2002-02-04 2003-08-14 Applied Materials Israel, Ltd. A system and method for inspecting charged particle responsive resist
JP4748714B2 (ja) * 2005-10-28 2011-08-17 エスアイアイ・ナノテクノロジー株式会社 荷電粒子ビーム走査照射方法、荷電粒子ビーム装置、試料観察方法、及び、試料加工方法
EP2735866A1 (en) * 2012-11-27 2014-05-28 Fei Company Method of sampling a sample and displaying obtained information

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5236410A (en) * 1975-09-18 1977-03-19 Nippon Telegr & Teleph Corp <Ntt> Facsimile communicion system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5236410A (en) * 1975-09-18 1977-03-19 Nippon Telegr & Teleph Corp <Ntt> Facsimile communicion system

Also Published As

Publication number Publication date
JPS59214151A (ja) 1984-12-04

Similar Documents

Publication Publication Date Title
EP0450718B1 (en) Apparatus for geometrical correction of a distorted image
JPH06217964A (ja) 走査x線画像システムのデジタル制御方法及び装置
US20060108525A1 (en) Scanning electron microscope and system for inspecting semiconductor device
GB2208432A (en) Charged particle beam analyser
DE4230506A1 (de) Rasterpunktscanner kleiner masse, sowie rasterpunkt-scanverfahren
JP3290483B2 (ja) 統計的画素サンプリングによってデジタル影像を処理してヒストグラムを作製する方法
JP3230911B2 (ja) 走査電子顕微鏡及びその画像形成方法
JPH0524615B2 (nl)
US6477228B2 (en) Method for operating an X-ray diagnosis device with immediate imaging
US6480619B1 (en) Method of displaying part of a radiographic image
JP3373585B2 (ja) 走査型プローブ加工観察装置
JPH0792588A (ja) 光刺激性蛍光スクリーンに記録された放射線画像を読み取るための装置の感度をモニターする方法
JP2716949B2 (ja) X線診断装置
JP2726587B2 (ja) 電子ビーム照射装置および電気信号検出装置
US5495110A (en) Observation method and apparatus for removing an oxidation layer and forming an image from a sample
JP2786849B2 (ja) X線診断装置
JP2962527B2 (ja) 電荷画像走査装置
JP3278012B2 (ja) X線マッピング分析方法
JP2000097881A (ja) X線検査装置、x線検査用画像処理装置、x線検査装置用画像処理プログラムが格納された記録媒体
JP2003007244A (ja) 荷電粒子線装置における像の表示方法および荷電粒子線装置、並びに分析装置における像の表示方法及び分析装置
JPH09198498A (ja) 映像信号処理方法および装置
JP3303441B2 (ja) 電子線分析装置
JP2775928B2 (ja) 表面分析装置
EP0127856A2 (en) Apparatus for examining an object by using ultrasonic beams
JP3790629B2 (ja) 走査型荷電粒子ビーム装置及び走査型荷電粒子ビーム装置の動作方法