JPH0519520B2 - - Google Patents
Info
- Publication number
- JPH0519520B2 JPH0519520B2 JP63148903A JP14890388A JPH0519520B2 JP H0519520 B2 JPH0519520 B2 JP H0519520B2 JP 63148903 A JP63148903 A JP 63148903A JP 14890388 A JP14890388 A JP 14890388A JP H0519520 B2 JPH0519520 B2 JP H0519520B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- thin film
- diamond thin
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010432 diamond Substances 0.000 claims description 79
- 229910003460 diamond Inorganic materials 0.000 claims description 74
- 239000010408 film Substances 0.000 claims description 66
- 239000000758 substrate Substances 0.000 claims description 60
- 239000010409 thin film Substances 0.000 claims description 54
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 21
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 20
- 239000013081 microcrystal Substances 0.000 claims description 14
- 230000006911 nucleation Effects 0.000 claims description 12
- 238000010899 nucleation Methods 0.000 claims description 12
- 238000005229 chemical vapour deposition Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910010271 silicon carbide Inorganic materials 0.000 description 17
- 239000007789 gas Substances 0.000 description 9
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000000137 annealing Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 229910003481 amorphous carbon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 101710162453 Replication factor A Proteins 0.000 description 1
- 102100035729 Replication protein A 70 kDa DNA-binding subunit Human genes 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910034327 TiC Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001941 electron spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14890388A JPH01317197A (ja) | 1988-06-16 | 1988-06-16 | ダイヤモンド薄膜基板およびその製法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14890388A JPH01317197A (ja) | 1988-06-16 | 1988-06-16 | ダイヤモンド薄膜基板およびその製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01317197A JPH01317197A (ja) | 1989-12-21 |
| JPH0519520B2 true JPH0519520B2 (fr) | 1993-03-16 |
Family
ID=15463247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14890388A Granted JPH01317197A (ja) | 1988-06-16 | 1988-06-16 | ダイヤモンド薄膜基板およびその製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01317197A (fr) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02263789A (ja) * | 1989-03-31 | 1990-10-26 | Kanagawa Pref Gov | ダイヤモンド単結晶膜を有するシリコン基板とその製造方法 |
| JP2775903B2 (ja) * | 1989-10-04 | 1998-07-16 | 住友電気工業株式会社 | ダイヤモンド半導体素子 |
| US5260106A (en) * | 1990-08-03 | 1993-11-09 | Fujitsu Limited | Method for forming diamond films by plasma jet CVD |
| JP2617374B2 (ja) * | 1990-09-25 | 1997-06-04 | 株式会社半導体エネルギー研究所 | ダイヤモンド薄膜とその作製方法 |
| US5626963A (en) * | 1993-07-07 | 1997-05-06 | Sanyo Electric Co., Ltd. | Hard-carbon-film-coated substrate and apparatus for forming the same |
| US5691010A (en) * | 1993-10-19 | 1997-11-25 | Sanyo Electric Co., Ltd. | Arc discharge plasma CVD method for forming diamond-like carbon films |
| DE4415601C2 (de) * | 1994-05-04 | 1997-12-18 | Daimler Benz Ag | Komposit-Struktur für elektronische Bauteile und Verfahren zu deren Herstellung |
| US6066399A (en) * | 1997-03-19 | 2000-05-23 | Sanyo Electric Co., Ltd. | Hard carbon thin film and method of forming the same |
| US6335863B1 (en) * | 1998-01-16 | 2002-01-01 | Sumitomo Electric Industries, Ltd. | Package for semiconductors, and semiconductor module that employs the package |
| JP3631366B2 (ja) * | 1998-03-11 | 2005-03-23 | 株式会社神戸製鋼所 | 単結晶ダイヤモンド合成用基板 |
| JP4560964B2 (ja) * | 2000-02-25 | 2010-10-13 | 住友電気工業株式会社 | 非晶質炭素被覆部材 |
| FR2856078B1 (fr) * | 2003-06-16 | 2006-11-17 | Commissariat Energie Atomique | Revetement pour une piece mecanique comprenant au moins du carbone amorphe hydrogene et procede de depot d'un tel revetement. |
| JP2005054264A (ja) * | 2003-08-07 | 2005-03-03 | Ebara Corp | ダイアモンド電極の成膜方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6325662A (ja) * | 1986-07-18 | 1988-02-03 | Fuji Electric Co Ltd | 電子写真感光体 |
| JPS63138395A (ja) * | 1986-12-01 | 1988-06-10 | 小糸工業株式会社 | 情報表示装置 |
| JPS63153275A (ja) * | 1986-08-11 | 1988-06-25 | Sumitomo Electric Ind Ltd | ダイヤモンド被覆アルミナ |
-
1988
- 1988-06-16 JP JP14890388A patent/JPH01317197A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6325662A (ja) * | 1986-07-18 | 1988-02-03 | Fuji Electric Co Ltd | 電子写真感光体 |
| JPS63153275A (ja) * | 1986-08-11 | 1988-06-25 | Sumitomo Electric Ind Ltd | ダイヤモンド被覆アルミナ |
| JPS63138395A (ja) * | 1986-12-01 | 1988-06-10 | 小糸工業株式会社 | 情報表示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01317197A (ja) | 1989-12-21 |
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