JPH0517874Y2 - - Google Patents
Info
- Publication number
- JPH0517874Y2 JPH0517874Y2 JP5816188U JP5816188U JPH0517874Y2 JP H0517874 Y2 JPH0517874 Y2 JP H0517874Y2 JP 5816188 U JP5816188 U JP 5816188U JP 5816188 U JP5816188 U JP 5816188U JP H0517874 Y2 JPH0517874 Y2 JP H0517874Y2
- Authority
- JP
- Japan
- Prior art keywords
- exposed
- suction
- chuck
- mounting table
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000002093 peripheral effect Effects 0.000 claims description 7
- 230000009467 reduction Effects 0.000 description 15
- 235000012431 wafers Nutrition 0.000 description 14
- 238000013016 damping Methods 0.000 description 10
- 230000007246 mechanism Effects 0.000 description 10
- 238000005096 rolling process Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5816188U JPH0517874Y2 (enrdf_load_stackoverflow) | 1988-04-28 | 1988-04-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5816188U JPH0517874Y2 (enrdf_load_stackoverflow) | 1988-04-28 | 1988-04-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01161325U JPH01161325U (enrdf_load_stackoverflow) | 1989-11-09 |
JPH0517874Y2 true JPH0517874Y2 (enrdf_load_stackoverflow) | 1993-05-13 |
Family
ID=31283986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5816188U Expired - Lifetime JPH0517874Y2 (enrdf_load_stackoverflow) | 1988-04-28 | 1988-04-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0517874Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4583903B2 (ja) * | 2004-12-15 | 2010-11-17 | 日本電子株式会社 | 移動ブロック支持機構及びステージ装置並びに荷電粒子ビーム装置 |
-
1988
- 1988-04-28 JP JP5816188U patent/JPH0517874Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH01161325U (enrdf_load_stackoverflow) | 1989-11-09 |