JPH0516450B2 - - Google Patents

Info

Publication number
JPH0516450B2
JPH0516450B2 JP60184924A JP18492485A JPH0516450B2 JP H0516450 B2 JPH0516450 B2 JP H0516450B2 JP 60184924 A JP60184924 A JP 60184924A JP 18492485 A JP18492485 A JP 18492485A JP H0516450 B2 JPH0516450 B2 JP H0516450B2
Authority
JP
Japan
Prior art keywords
acrylate
meth
polyols
parts
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60184924A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6243412A (ja
Inventor
Kazunori Kanda
Akio Tomotsugi
Ryuzo Mizuguchi
Iwao Sumyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP60184924A priority Critical patent/JPS6243412A/ja
Publication of JPS6243412A publication Critical patent/JPS6243412A/ja
Publication of JPH0516450B2 publication Critical patent/JPH0516450B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP60184924A 1985-08-21 1985-08-21 高エネルギ−線硬化樹脂組成物 Granted JPS6243412A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60184924A JPS6243412A (ja) 1985-08-21 1985-08-21 高エネルギ−線硬化樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60184924A JPS6243412A (ja) 1985-08-21 1985-08-21 高エネルギ−線硬化樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6243412A JPS6243412A (ja) 1987-02-25
JPH0516450B2 true JPH0516450B2 (enExample) 1993-03-04

Family

ID=16161713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60184924A Granted JPS6243412A (ja) 1985-08-21 1985-08-21 高エネルギ−線硬化樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6243412A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2612484B2 (ja) * 1988-11-18 1997-05-21 ディーエスエム・エヌヴィ 光学的立体造形用樹脂組成物
EP1008911A1 (en) * 1998-12-11 2000-06-14 Shipley Company LLC Photoimageable compositions having improved flexibility and stripping ability
JP4826094B2 (ja) * 2005-02-10 2011-11-30 日立化成工業株式会社 光硬化型樹脂組成物、およびこれを用いてなる回折型集光フィルム
JPWO2007145246A1 (ja) * 2006-06-14 2009-11-05 日立化成工業株式会社 樹脂組成物、およびこれを用いてなる積層型光学部材
EP1930381B1 (en) * 2006-12-05 2009-02-18 DSMIP Assets B.V. Radiation-curable coating composition
JP5701613B2 (ja) 2009-01-15 2015-04-15 株式会社カネカ 硬化性組成物、その硬化物、及びその製造方法
WO2011052690A1 (ja) * 2009-10-28 2011-05-05 株式会社カネカ 光硬化性塗料組成物、及びそれを硬化させてなる塗膜
JP5738261B2 (ja) 2012-05-16 2015-06-17 株式会社日立産機システム エポキシ‐ビニル共重合型液状樹脂組成物、その硬化物、製造方法及び硬化物を用いた絶縁材料、電子・電気機器
TWI625359B (zh) * 2012-11-22 2018-06-01 Mitsubishi Chemical Corporation 活性能量射線硬化性樹脂組成物、塗佈劑組成物及疊層體
WO2017020159A1 (en) * 2015-07-31 2017-02-09 Arkema France Polyurethane (meth)acrylate oligomers and curable compositions comprising said oligomers
KR20240072252A (ko) * 2021-10-05 2024-05-23 신에쓰 가가꾸 고교 가부시끼가이샤 고무 입자, 복합 입자, 및 그들의 제조 방법

Also Published As

Publication number Publication date
JPS6243412A (ja) 1987-02-25

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