JPH0516177B2 - - Google Patents
Info
- Publication number
- JPH0516177B2 JPH0516177B2 JP56091802A JP9180281A JPH0516177B2 JP H0516177 B2 JPH0516177 B2 JP H0516177B2 JP 56091802 A JP56091802 A JP 56091802A JP 9180281 A JP9180281 A JP 9180281A JP H0516177 B2 JPH0516177 B2 JP H0516177B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- substrate
- defect
- region
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Electrodes Of Semiconductors (AREA)
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56091802A JPS57207366A (en) | 1981-06-15 | 1981-06-15 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56091802A JPS57207366A (en) | 1981-06-15 | 1981-06-15 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57207366A JPS57207366A (en) | 1982-12-20 |
JPH0516177B2 true JPH0516177B2 (enrdf_load_stackoverflow) | 1993-03-03 |
Family
ID=14036745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56091802A Granted JPS57207366A (en) | 1981-06-15 | 1981-06-15 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57207366A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3542189B2 (ja) * | 1995-03-08 | 2004-07-14 | 株式会社ルネサステクノロジ | 半導体装置の製造方法及び半導体装置 |
JP2000232222A (ja) | 1999-02-10 | 2000-08-22 | Nec Corp | 半導体装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320862A (en) * | 1976-08-11 | 1978-02-25 | Hitachi Ltd | Production of semiconductor device |
-
1981
- 1981-06-15 JP JP56091802A patent/JPS57207366A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57207366A (en) | 1982-12-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100741442B1 (ko) | 반도체 장치 및 반도체 장치의 제조 방법 | |
JP2937817B2 (ja) | 半導体基板表面の酸化膜の形成方法及びmos半導体デバイスの製造方法 | |
US5089432A (en) | Polycide gate MOSFET process for integrated circuits | |
EP0696051A1 (en) | Method for fabricating oxide layer in semiconductor technology | |
JPH08162433A (ja) | イオンドーピング装置のクリーニング方法 | |
US5328867A (en) | Peroxide clean before buried contact polysilicon deposition | |
JP2000294549A (ja) | 半導体装置及びその製造方法 | |
JPH0312785B2 (enrdf_load_stackoverflow) | ||
JP3077760B2 (ja) | 固相拡散方法 | |
JPH032338B2 (enrdf_load_stackoverflow) | ||
JPH0516177B2 (enrdf_load_stackoverflow) | ||
JP3336604B2 (ja) | 半導体装置の製造方法 | |
JPS6261345A (ja) | 半導体装置の製造方法 | |
JP3033518B2 (ja) | 半導体装置の製造方法 | |
JPH08186082A (ja) | 半導体装置の製造方法 | |
KR100770499B1 (ko) | 게이트 산화막 제조 방법 | |
JPH09129872A (ja) | 半導体素子の製造方法 | |
JPH11176959A (ja) | 半導体装置の製造方法 | |
JPH06181219A (ja) | 半導体装置の製造方法 | |
JPH0590254A (ja) | 半導体装置の製造方法 | |
JPH02181918A (ja) | 半導体装置の製造方法 | |
JPH03102875A (ja) | 半導体装置およびその製造方法 | |
JPH0330293B2 (enrdf_load_stackoverflow) | ||
JPH05275528A (ja) | 素子分離領域の形成方法 | |
JP3071840B2 (ja) | 半導体装置の製造方法 |