JPH0515059B2 - - Google Patents

Info

Publication number
JPH0515059B2
JPH0515059B2 JP58181895A JP18189583A JPH0515059B2 JP H0515059 B2 JPH0515059 B2 JP H0515059B2 JP 58181895 A JP58181895 A JP 58181895A JP 18189583 A JP18189583 A JP 18189583A JP H0515059 B2 JPH0515059 B2 JP H0515059B2
Authority
JP
Japan
Prior art keywords
tube
gas
semiconductor substrate
reaction
axial direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58181895A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6074429A (ja
Inventor
Hideo Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18189583A priority Critical patent/JPS6074429A/ja
Publication of JPS6074429A publication Critical patent/JPS6074429A/ja
Publication of JPH0515059B2 publication Critical patent/JPH0515059B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
JP18189583A 1983-09-29 1983-09-29 プラズマ処理装置 Granted JPS6074429A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18189583A JPS6074429A (ja) 1983-09-29 1983-09-29 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18189583A JPS6074429A (ja) 1983-09-29 1983-09-29 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS6074429A JPS6074429A (ja) 1985-04-26
JPH0515059B2 true JPH0515059B2 (enExample) 1993-02-26

Family

ID=16108759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18189583A Granted JPS6074429A (ja) 1983-09-29 1983-09-29 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS6074429A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2915901B1 (de) * 2014-03-07 2019-02-27 Meyer Burger (Germany) AG Vorrichtung zur Plasmaprozessierung mit Prozessgaszirkulation in multiplen Plasmen

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710937A (en) * 1980-06-25 1982-01-20 Mitsubishi Electric Corp Plasma gaseous phase growth device

Also Published As

Publication number Publication date
JPS6074429A (ja) 1985-04-26

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