JPH048780B2 - - Google Patents

Info

Publication number
JPH048780B2
JPH048780B2 JP59107040A JP10704084A JPH048780B2 JP H048780 B2 JPH048780 B2 JP H048780B2 JP 59107040 A JP59107040 A JP 59107040A JP 10704084 A JP10704084 A JP 10704084A JP H048780 B2 JPH048780 B2 JP H048780B2
Authority
JP
Japan
Prior art keywords
pattern
scanning
pulses
signal
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59107040A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60250629A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59107040A priority Critical patent/JPS60250629A/ja
Publication of JPS60250629A publication Critical patent/JPS60250629A/ja
Publication of JPH048780B2 publication Critical patent/JPH048780B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP59107040A 1984-05-25 1984-05-25 マスクの検査方法 Granted JPS60250629A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59107040A JPS60250629A (ja) 1984-05-25 1984-05-25 マスクの検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59107040A JPS60250629A (ja) 1984-05-25 1984-05-25 マスクの検査方法

Publications (2)

Publication Number Publication Date
JPS60250629A JPS60250629A (ja) 1985-12-11
JPH048780B2 true JPH048780B2 (enrdf_load_stackoverflow) 1992-02-18

Family

ID=14448993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59107040A Granted JPS60250629A (ja) 1984-05-25 1984-05-25 マスクの検査方法

Country Status (1)

Country Link
JP (1) JPS60250629A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11104618B2 (en) 2015-07-20 2021-08-31 Sabic Global Technologies B.V. Fertilizer composition and methods of making and using same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62263646A (ja) * 1986-05-12 1987-11-16 Toshiba Corp ウエハ検査装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5681413A (en) * 1979-12-06 1981-07-03 Fujitsu Ltd Inspection system for pattern
JPS5961136A (ja) * 1982-09-30 1984-04-07 Toshiba Corp マスク欠陥検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11104618B2 (en) 2015-07-20 2021-08-31 Sabic Global Technologies B.V. Fertilizer composition and methods of making and using same

Also Published As

Publication number Publication date
JPS60250629A (ja) 1985-12-11

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