JPH0458623B2 - - Google Patents

Info

Publication number
JPH0458623B2
JPH0458623B2 JP59077828A JP7782884A JPH0458623B2 JP H0458623 B2 JPH0458623 B2 JP H0458623B2 JP 59077828 A JP59077828 A JP 59077828A JP 7782884 A JP7782884 A JP 7782884A JP H0458623 B2 JPH0458623 B2 JP H0458623B2
Authority
JP
Japan
Prior art keywords
pattern
negative
signal
mask
dimensions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59077828A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60220934A (ja
Inventor
Shogo Matsui
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59077828A priority Critical patent/JPS60220934A/ja
Publication of JPS60220934A publication Critical patent/JPS60220934A/ja
Publication of JPH0458623B2 publication Critical patent/JPH0458623B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP59077828A 1984-04-17 1984-04-17 マスクの検査方法 Granted JPS60220934A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59077828A JPS60220934A (ja) 1984-04-17 1984-04-17 マスクの検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59077828A JPS60220934A (ja) 1984-04-17 1984-04-17 マスクの検査方法

Publications (2)

Publication Number Publication Date
JPS60220934A JPS60220934A (ja) 1985-11-05
JPH0458623B2 true JPH0458623B2 (enrdf_load_stackoverflow) 1992-09-18

Family

ID=13644898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59077828A Granted JPS60220934A (ja) 1984-04-17 1984-04-17 マスクの検査方法

Country Status (1)

Country Link
JP (1) JPS60220934A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus
JPS5491181A (en) * 1977-12-28 1979-07-19 Fujitsu Ltd Pattern deffect discrimination

Also Published As

Publication number Publication date
JPS60220934A (ja) 1985-11-05

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