JPS60220934A - マスクの検査方法 - Google Patents

マスクの検査方法

Info

Publication number
JPS60220934A
JPS60220934A JP59077828A JP7782884A JPS60220934A JP S60220934 A JPS60220934 A JP S60220934A JP 59077828 A JP59077828 A JP 59077828A JP 7782884 A JP7782884 A JP 7782884A JP S60220934 A JPS60220934 A JP S60220934A
Authority
JP
Japan
Prior art keywords
mask
pattern
signal
graphic
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59077828A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0458623B2 (enrdf_load_stackoverflow
Inventor
Shogo Matsui
正五 松井
Kenichi Kobayashi
賢一 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59077828A priority Critical patent/JPS60220934A/ja
Publication of JPS60220934A publication Critical patent/JPS60220934A/ja
Publication of JPH0458623B2 publication Critical patent/JPH0458623B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP59077828A 1984-04-17 1984-04-17 マスクの検査方法 Granted JPS60220934A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59077828A JPS60220934A (ja) 1984-04-17 1984-04-17 マスクの検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59077828A JPS60220934A (ja) 1984-04-17 1984-04-17 マスクの検査方法

Publications (2)

Publication Number Publication Date
JPS60220934A true JPS60220934A (ja) 1985-11-05
JPH0458623B2 JPH0458623B2 (enrdf_load_stackoverflow) 1992-09-18

Family

ID=13644898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59077828A Granted JPS60220934A (ja) 1984-04-17 1984-04-17 マスクの検査方法

Country Status (1)

Country Link
JP (1) JPS60220934A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus
JPS5491181A (en) * 1977-12-28 1979-07-19 Fujitsu Ltd Pattern deffect discrimination

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus
JPS5491181A (en) * 1977-12-28 1979-07-19 Fujitsu Ltd Pattern deffect discrimination

Also Published As

Publication number Publication date
JPH0458623B2 (enrdf_load_stackoverflow) 1992-09-18

Similar Documents

Publication Publication Date Title
US7133548B2 (en) Method and apparatus for reticle inspection using aerial imaging
JP3668215B2 (ja) パターン検査装置
US4718767A (en) Method of inspecting the pattern on a photographic mask
US4123170A (en) Apparatus for detecting defects in patterns
US4527070A (en) Method and apparatus for inspecting a pattern
JPH034895B2 (enrdf_load_stackoverflow)
JPS60220934A (ja) マスクの検査方法
JPS60250629A (ja) マスクの検査方法
JPS60231325A (ja) マスクの検査方法
JPS61207953A (ja) 自動外観検査装置
JPS6246239A (ja) 表面異物検査装置
JPS58196445A (ja) マスク検査方法
Sandland Automatic inspection of mask defects
JPS63124939A (ja) パターン検査方法およびその装置
JPH01239922A (ja) パターン欠陥検査装置
JPS5846636A (ja) パタ−ンの欠陥検査装置
JPH0145735B2 (enrdf_load_stackoverflow)
JPH01305477A (ja) 外観欠陥検査方法
JPS6165444A (ja) 被検査チツプの回路パタ−ン外観検査方法並びにその装置
JPH02110565A (ja) フォトマスク検査装置およびフォトマスク検査法
KR920008035B1 (ko) 반도체 장비의 촛점심도 점검 레티클 구조
Jozefov et al. Die-To-Database Inspection-An Effective Method Of Detecting And Locating Defects On Reticles
JPH11191528A (ja) フォトマスクの欠陥検査装置
JPS6412383B2 (enrdf_load_stackoverflow)
JPH07261373A (ja) マスクの欠陥検出方法