JPS60250629A - マスクの検査方法 - Google Patents

マスクの検査方法

Info

Publication number
JPS60250629A
JPS60250629A JP59107040A JP10704084A JPS60250629A JP S60250629 A JPS60250629 A JP S60250629A JP 59107040 A JP59107040 A JP 59107040A JP 10704084 A JP10704084 A JP 10704084A JP S60250629 A JPS60250629 A JP S60250629A
Authority
JP
Japan
Prior art keywords
pattern
scanning
prescribed
signal
pulses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59107040A
Other languages
English (en)
Japanese (ja)
Other versions
JPH048780B2 (enrdf_load_stackoverflow
Inventor
Shogo Matsui
正五 松井
Kenichi Kobayashi
賢一 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59107040A priority Critical patent/JPS60250629A/ja
Publication of JPS60250629A publication Critical patent/JPS60250629A/ja
Publication of JPH048780B2 publication Critical patent/JPH048780B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP59107040A 1984-05-25 1984-05-25 マスクの検査方法 Granted JPS60250629A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59107040A JPS60250629A (ja) 1984-05-25 1984-05-25 マスクの検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59107040A JPS60250629A (ja) 1984-05-25 1984-05-25 マスクの検査方法

Publications (2)

Publication Number Publication Date
JPS60250629A true JPS60250629A (ja) 1985-12-11
JPH048780B2 JPH048780B2 (enrdf_load_stackoverflow) 1992-02-18

Family

ID=14448993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59107040A Granted JPS60250629A (ja) 1984-05-25 1984-05-25 マスクの検査方法

Country Status (1)

Country Link
JP (1) JPS60250629A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62263646A (ja) * 1986-05-12 1987-11-16 Toshiba Corp ウエハ検査装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2993131A1 (en) 2015-07-20 2017-01-26 Sabic Global Technologies B.V. An extruded fertilizer core particle comprising a urease inhibitor and/or a nitrification inhibitor and a binder therefor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5681413A (en) * 1979-12-06 1981-07-03 Fujitsu Ltd Inspection system for pattern
JPS5961136A (ja) * 1982-09-30 1984-04-07 Toshiba Corp マスク欠陥検査装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5681413A (en) * 1979-12-06 1981-07-03 Fujitsu Ltd Inspection system for pattern
JPS5961136A (ja) * 1982-09-30 1984-04-07 Toshiba Corp マスク欠陥検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62263646A (ja) * 1986-05-12 1987-11-16 Toshiba Corp ウエハ検査装置

Also Published As

Publication number Publication date
JPH048780B2 (enrdf_load_stackoverflow) 1992-02-18

Similar Documents

Publication Publication Date Title
JP3668215B2 (ja) パターン検査装置
KR890003145B1 (ko) 반도체장치 제조용 마스크패턴 검사방법
US5173719A (en) Method and apparatus for the inspection of patterns
US4547895A (en) Pattern inspection system
JPH0160767B2 (enrdf_load_stackoverflow)
JPS60215286A (ja) 対象物における面模様をオプトエレクトロニクス検査する方法とその装置
US5012523A (en) Dimension checking method
US4527070A (en) Method and apparatus for inspecting a pattern
JPS60250629A (ja) マスクの検査方法
JPS60220934A (ja) マスクの検査方法
JPS60231325A (ja) マスクの検査方法
JPS63124939A (ja) パターン検査方法およびその装置
JPS61140804A (ja) パタ−ン検査装置
JPS6061604A (ja) パタ−ン検査装置
JPH036410A (ja) パターン検査装置
JPS6135303A (ja) パタ−ン欠陥検査装置
JPH0145735B2 (enrdf_load_stackoverflow)
JP2536727B2 (ja) パタ―ン検査装置
JPS62237305A (ja) パタ−ン欠陥検査方法
JPH04236346A (ja) スルーホール検査装置
JPH11191528A (ja) フォトマスクの欠陥検査装置
JPS59121335A (ja) フオトマスクの検査方法及び装置
Doyle Automatic Optical Inspection of Printed Circuit Boards
JPH05152403A (ja) パターン検査装置
JPH04348210A (ja) プリント実装基板検査装置