JPH0478267U - - Google Patents

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Publication number
JPH0478267U
JPH0478267U JP12266290U JP12266290U JPH0478267U JP H0478267 U JPH0478267 U JP H0478267U JP 12266290 U JP12266290 U JP 12266290U JP 12266290 U JP12266290 U JP 12266290U JP H0478267 U JPH0478267 U JP H0478267U
Authority
JP
Japan
Prior art keywords
substrate
pattern
photomask
etching
aperture plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12266290U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12266290U priority Critical patent/JPH0478267U/ja
Publication of JPH0478267U publication Critical patent/JPH0478267U/ja
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図A,B、第2図は、この考案にかかる外
装部品のパターンエツチング用治具を使用しての
実施例を示す断面図、第4図A,Bは本治具を使
用して加工する部品の一例を示す平面図及び断面
図、第5図は、この考案に使用する、露光用多数
個取りフオトマスクフイルムの平面図である。 1……ピンガイド穴、2……開口穴、3……部
品保持溝、4……開口板、5……部品保持板、6
……ガイドピン、7……部品、8……部品の斜面
部品、9……部品のサイド部、10……位置合せ
マーク、11……フイルムタイプフオトレジスト
、12……露光用多数個取りフオトマスクフイル
ム。
Figures 1A and B and Figure 2 are cross-sectional views showing examples using the pattern etching jig for exterior parts according to this invention, and Figures 4A and B are cross-sectional views showing examples using this jig. FIG. 5 is a plan view and a sectional view showing an example of the parts to be processed. FIG. 5 is a plan view of a multi-piece photomask film for exposure used in this invention. 1... Pin guide hole, 2... Opening hole, 3... Component holding groove, 4... Opening plate, 5... Part holding plate, 6
... Guide pin, 7 ... Part, 8 ... Slope part of part, 9 ... Side part of part, 10 ... Alignment mark, 11 ... Film type photoresist, 12 ... Multi-piece photo for exposure. mask film.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 外装部品などの立体形状の表面に所望のパター
ンのエツチング加工において、基板に被加工物が
嵌合する溝をフオトマスクのパターンピツチに合
致するよう複数個配置し、かつ感光性ドライフイ
ルムラミネート時の被加工物の高さ調整のための
開口板を組合せ、更に基板とフオトマスクフイル
ムとの位置合せのためのピンガイドを基板と開口
板上に複数個設けたことを特徴とする外装部品パ
ターンエツチング用治具。
When etching a desired pattern on the surface of a three-dimensional shape such as an exterior part, a plurality of grooves into which the workpiece fits are arranged on the substrate so as to match the pattern pitch of the photomask, and when laminating the photosensitive dry film. For pattern etching of exterior parts, characterized by combining an aperture plate for adjusting the height of the workpiece, and further providing a plurality of pin guides on the substrate and the aperture plate for positioning the substrate and photomask film. jig.
JP12266290U 1990-11-22 1990-11-22 Pending JPH0478267U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12266290U JPH0478267U (en) 1990-11-22 1990-11-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12266290U JPH0478267U (en) 1990-11-22 1990-11-22

Publications (1)

Publication Number Publication Date
JPH0478267U true JPH0478267U (en) 1992-07-08

Family

ID=31870423

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12266290U Pending JPH0478267U (en) 1990-11-22 1990-11-22

Country Status (1)

Country Link
JP (1) JPH0478267U (en)

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