JPH0457854U - - Google Patents
Info
- Publication number
- JPH0457854U JPH0457854U JP9972690U JP9972690U JPH0457854U JP H0457854 U JPH0457854 U JP H0457854U JP 9972690 U JP9972690 U JP 9972690U JP 9972690 U JP9972690 U JP 9972690U JP H0457854 U JPH0457854 U JP H0457854U
- Authority
- JP
- Japan
- Prior art keywords
- photoresist layer
- light source
- substrate
- photomask
- illuminating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 1
Description
第１図〜第３図は本考案の実施例を示しており
、第１図は実施例に係る露光装置の斜視図、第２
図はその断面図を示し、第３図Ａ〜Ｄはこの露光
装置を使用したフオトリソグラフイー法の工程を
示し、第３図Ａ〜Ｄのａは工程途上の平面図、第
３図Ａ〜Ｄのｂはその断面図を夫々示しており、
また、第４図は従来における露光装置の断面図、
第５図Ａ〜Ｄはこの露光装置を使用したフオトリ
ソグラフイー法の工程を示し、第５図Ａ〜Ｄのａ
は工程途上の平面図、第５図Ａ〜Ｄのｂはその断
面図を夫々示している。
符号説明、１……微動台、２……主光源、３…
…副光源、５……基板、６……マスク、５０……
フオトレジスト層、５１……金属層。
1 to 3 show an embodiment of the present invention, in which FIG. 1 is a perspective view of an exposure apparatus according to the embodiment, and FIG.
The figure shows a cross-sectional view, and FIGS. 3A to 3D show the photolithography process using this exposure apparatus. b of D shows the cross-sectional view,
FIG. 4 is a cross-sectional view of a conventional exposure apparatus.
FIGS. 5A to 5D show the photolithography process using this exposure apparatus, and the a of FIGS.
5 shows a plan view in the middle of the process, and b in FIGS. 5A to 5D shows a cross-sectional view thereof. Code explanation, 1... fine movement table, 2... main light source, 3...
...Sub-light source, 5...Substrate, 6...Mask, 50...
Photoresist layer, 51...metal layer.
Claims (1)
記フオトレジスト層に光透過性パターンを有する
フオトマスクを密着し、この状態でもつてフオト
マスク側に設けられた光源を照射させて上記フオ
トレジスト層をパターン状に照明する露光装置に
おいて、 上記光源に加えて基板周縁部のフオトレジスト
層を均一に照明する副光源を設けたことを特徴と
する露光装置。[Claims for Utility Model Registration] A photomask having a light-transmitting pattern is brought into close contact with the photoresist layer of a substrate provided with the photoresist layer over its entire surface, and in this state, a light source provided on the photomask side is irradiated. An exposure apparatus for illuminating the photoresist layer in a pattern, characterized in that an auxiliary light source is provided in addition to the light source for uniformly illuminating the photoresist layer at the peripheral edge of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9972690U JPH0457854U (en) | 1990-09-26 | 1990-09-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9972690U JPH0457854U (en) | 1990-09-26 | 1990-09-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0457854U true JPH0457854U (en) | 1992-05-18 |
Family
ID=31841849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9972690U Pending JPH0457854U (en) | 1990-09-26 | 1990-09-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0457854U (en) |
-
1990
- 1990-09-26 JP JP9972690U patent/JPH0457854U/ja active Pending