JPH0359634U - - Google Patents
Info
- Publication number
- JPH0359634U JPH0359634U JP11967089U JP11967089U JPH0359634U JP H0359634 U JPH0359634 U JP H0359634U JP 11967089 U JP11967089 U JP 11967089U JP 11967089 U JP11967089 U JP 11967089U JP H0359634 U JPH0359634 U JP H0359634U
- Authority
- JP
- Japan
- Prior art keywords
- overlay
- pattern
- blanks
- blank itself
- blank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005259 measurement Methods 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 230000007547 defect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Description
第１図は本考案の実施例を示すブランクスの構
成図、第２図はそのブランクスに設けられる測定
用パターンの拡大平面図、第３図は従来の電子ビ
ーム露光装置によるマスクパターンの作成を説明
する図である。
３……ブランクス、５……オーバーレイ測定用
パターン、６……クロム層、７……ガラス基板。
Fig. 1 is a configuration diagram of a blank showing an embodiment of the present invention, Fig. 2 is an enlarged plan view of a measurement pattern provided on the blank, and Fig. 3 explains the creation of a mask pattern using a conventional electron beam exposure device. This is a diagram. 3...Blank, 5...Overlay measurement pattern, 6...Chromium layer, 7...Glass substrate.
Claims (1)
るブランクスにおいて、 前記ブランクス自体にオーバーレイ測定用パタ
ーンを形成し、ブランクス自体の位置変化時にも
オーバーレイを補正可能にしてなるオーバーレイ
不良防止用パターン付きブランクス。[Claims for Utility Model Registration] In blanks in which a mask pattern is created by electron beam exposure, a pattern for overlay measurement is formed on the blank itself, and the overlay can be corrected even when the position of the blank itself changes, thereby preventing overlay defects. Blanks with a pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11967089U JPH0359634U (en) | 1989-10-16 | 1989-10-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11967089U JPH0359634U (en) | 1989-10-16 | 1989-10-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0359634U true JPH0359634U (en) | 1991-06-12 |
Family
ID=31667780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11967089U Pending JPH0359634U (en) | 1989-10-16 | 1989-10-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0359634U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006110044A (en) * | 2004-10-14 | 2006-04-27 | Terumo Corp | Air pressure massage apparatus |
-
1989
- 1989-10-16 JP JP11967089U patent/JPH0359634U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006110044A (en) * | 2004-10-14 | 2006-04-27 | Terumo Corp | Air pressure massage apparatus |