JPH025749U - - Google Patents
Info
- Publication number
- JPH025749U JPH025749U JP8356088U JP8356088U JPH025749U JP H025749 U JPH025749 U JP H025749U JP 8356088 U JP8356088 U JP 8356088U JP 8356088 U JP8356088 U JP 8356088U JP H025749 U JPH025749 U JP H025749U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chromium
- pattern
- film
- inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 3
- 238000007689 inspection Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000007261 regionalization Effects 0.000 description 1
Description
第１図は実施例の側断面図、第２図ａ〜ｇは実
施例のパターン形成と再生の工程を示す側断面図
、第３図は従来例の側断面図、である。
図において、１はガラス基板、２はクロム膜、
３は中間膜、４はレジスト、である。
FIG. 1 is a side sectional view of the embodiment, FIGS. 2a to 2g are side sectional views showing the pattern formation and reproduction steps of the embodiment, and FIG. 3 is a side sectional view of the conventional example. In the figure, 1 is a glass substrate, 2 is a chromium film,
3 is an intermediate film, and 4 is a resist.
Claims (1)
るパターンを検査する際に用いられ、ガラス基板
上にクロム膜を有して上記パターンと同一パター
ンが形成される検査用ガラスマスクであつて、 上記基板と上記クロム膜との間に、該基板との
密着性がクロムより弱い材料の中間膜が介在して
なることを特徴とする検査用ガラスマスク。[Claims for Utility Model Registration] An inspection used when inspecting a pattern formed on a wafer using a reduction projection exposure method, in which a pattern identical to the above pattern is formed on a glass substrate with a chromium film. What is claimed is: 1. A glass mask for inspection, characterized in that an intermediate film of a material having weaker adhesion to the substrate than chromium is interposed between the substrate and the chromium film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8356088U JPH025749U (en) | 1988-06-24 | 1988-06-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8356088U JPH025749U (en) | 1988-06-24 | 1988-06-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH025749U true JPH025749U (en) | 1990-01-16 |
Family
ID=31308273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8356088U Pending JPH025749U (en) | 1988-06-24 | 1988-06-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH025749U (en) |
-
1988
- 1988-06-24 JP JP8356088U patent/JPH025749U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH025749U (en) | ||
| JPH0219149U (en) | ||
| JPH03114845U (en) | ||
| JPH0371326U (en) | ||
| JPS58419U (en) | reticle | |
| JPS59109349U (en) | photomask substrate | |
| JPS58185850U (en) | photomask | |
| JPS6088338U (en) | photo mask | |
| JPH0431146U (en) | ||
| JPH0343652U (en) | ||
| JPH0418426U (en) | ||
| JPH0331088U (en) | ||
| JPS6181657U (en) | ||
| JPS6068636U (en) | reticle mask | |
| JPS62123648U (en) | ||
| JPH025754U (en) | ||
| JPH0247649U (en) | ||
| JPS6185843U (en) | ||
| JPH0359634U (en) | ||
| JPS61140354U (en) | ||
| JPS60175659U (en) | printing screen | |
| JPS62173748U (en) | ||
| JPS63198074U (en) | ||
| JPH0279022U (en) | ||
| JPS5985294U (en) | hidden picture toy |