JPH0431146U - - Google Patents

Info

Publication number
JPH0431146U
JPH0431146U JP7255990U JP7255990U JPH0431146U JP H0431146 U JPH0431146 U JP H0431146U JP 7255990 U JP7255990 U JP 7255990U JP 7255990 U JP7255990 U JP 7255990U JP H0431146 U JPH0431146 U JP H0431146U
Authority
JP
Japan
Prior art keywords
substrate
mask pattern
light
transmitting
pattern formed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7255990U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7255990U priority Critical patent/JPH0431146U/ja
Publication of JPH0431146U publication Critical patent/JPH0431146U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、実施例の断面図、第2図は、実施例
の製造方法の説明図、第3図は、別の接着剤を説
明する断面図、第4図は、従来例の断面図である
。 11……フオトマスク、12……第1基板、1
3……第1マスクパターン、14……第2基板、
15……第2マスクパターン、16……接着剤。
Fig. 1 is a cross-sectional view of the example, Fig. 2 is an explanatory view of the manufacturing method of the example, Fig. 3 is a cross-sectional view explaining another adhesive, and Fig. 4 is a cross-sectional view of the conventional example. It is. 11...Photomask, 12...First substrate, 1
3...first mask pattern, 14...second substrate,
15...Second mask pattern, 16...Adhesive.

Claims (1)

【実用新案登録請求の範囲】 透光性の第1基板と、 前記第1基板の下面に形成した遮光性の第1マ
スクパターンと、 透光性の第2基板と、 前記第2基板の上面に形成した遮光性の第2マ
スクパターンとにより構成され、 前記第1基板の第1マスクパターン側と前記第
2基板の第2マスクパターン側とを対向させて、
前記第1基板と前記第2基板とを接着させたこと
を特徴とするフオトマスク。
[Claims for Utility Model Registration] A light-transmitting first substrate; a light-blocking first mask pattern formed on the lower surface of the first substrate; a light-transmitting second substrate; and an upper surface of the second substrate. a light-shielding second mask pattern formed on the substrate, with the first mask pattern side of the first substrate facing the second mask pattern side of the second substrate,
A photomask characterized in that the first substrate and the second substrate are bonded together.
JP7255990U 1990-07-06 1990-07-06 Pending JPH0431146U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7255990U JPH0431146U (en) 1990-07-06 1990-07-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7255990U JPH0431146U (en) 1990-07-06 1990-07-06

Publications (1)

Publication Number Publication Date
JPH0431146U true JPH0431146U (en) 1992-03-12

Family

ID=31610598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7255990U Pending JPH0431146U (en) 1990-07-06 1990-07-06

Country Status (1)

Country Link
JP (1) JPH0431146U (en)

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