JPS63187147U - - Google Patents
Info
- Publication number
- JPS63187147U JPS63187147U JP1987074250U JP7425087U JPS63187147U JP S63187147 U JPS63187147 U JP S63187147U JP 1987074250 U JP1987074250 U JP 1987074250U JP 7425087 U JP7425087 U JP 7425087U JP S63187147 U JPS63187147 U JP S63187147U
- Authority
- JP
- Japan
- Prior art keywords
- film
- utility
- electronic components
- scope
- registration request
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Description
第１図は、本考案フオトマスクの一実施例を示
す平面図、第２図は、従来のフオトマスク例を示
す平面図である。
１……フイルム、２……パターン、３……間〓
部、４，４′……透孔。
FIG. 1 is a plan view showing an embodiment of the photomask of the present invention, and FIG. 2 is a plan view showing an example of a conventional photomask. 1...Film, 2...Pattern, 3...Interval〓
Part, 4, 4'...through hole.
Claims (1)
用されるフイルム製フオトマスクにおいて、該フ
イルム面上に画かれたパターンの間〓部に１個以
上の透孔を設けてなるフオトマスク。 A film photomask used when manufacturing electronic components by a contact exposure method, which has one or more through holes provided between patterns drawn on the film surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987074250U JPS63187147U (en) | 1987-05-18 | 1987-05-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987074250U JPS63187147U (en) | 1987-05-18 | 1987-05-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63187147U true JPS63187147U (en) | 1988-11-30 |
Family
ID=30919291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987074250U Pending JPS63187147U (en) | 1987-05-18 | 1987-05-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63187147U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5315765A (en) * | 1976-07-28 | 1978-02-14 | Hitachi Ltd | Vacuum caontact prevention method of hard mask |
| JPS57176041A (en) * | 1981-04-22 | 1982-10-29 | Toray Ind Inc | Photomask for printing circuit and exposure method using this |
-
1987
- 1987-05-18 JP JP1987074250U patent/JPS63187147U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5315765A (en) * | 1976-07-28 | 1978-02-14 | Hitachi Ltd | Vacuum caontact prevention method of hard mask |
| JPS57176041A (en) * | 1981-04-22 | 1982-10-29 | Toray Ind Inc | Photomask for printing circuit and exposure method using this |
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