JPS62199940U - - Google Patents
Info
- Publication number
- JPS62199940U JPS62199940U JP8950386U JP8950386U JPS62199940U JP S62199940 U JPS62199940 U JP S62199940U JP 8950386 U JP8950386 U JP 8950386U JP 8950386 U JP8950386 U JP 8950386U JP S62199940 U JPS62199940 U JP S62199940U
- Authority
- JP
- Japan
- Prior art keywords
- alignment pattern
- pattern
- utility
- scope
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
第1図は本考案の一実施例の平面図である。
1……工程毎に用いられる目合せパターン、2
……トランジスタのパターン、3……ホトマスク
目合せパターン。
FIG. 1 is a plan view of an embodiment of the present invention. 1... Alignment pattern used for each process, 2
...Transistor pattern, 3...Photomask alignment pattern.
Claims (1)
に用いられる目合せパターンとを有することを特
徴とするホトマスク目合せパターン。 A photomask alignment pattern comprising a transistor pattern and an alignment pattern used in each photoresist process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8950386U JPS62199940U (en) | 1986-06-11 | 1986-06-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8950386U JPS62199940U (en) | 1986-06-11 | 1986-06-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62199940U true JPS62199940U (en) | 1987-12-19 |
Family
ID=30948544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8950386U Pending JPS62199940U (en) | 1986-06-11 | 1986-06-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62199940U (en) |
-
1986
- 1986-06-11 JP JP8950386U patent/JPS62199940U/ja active Pending