JPH03103442U - - Google Patents
Info
- Publication number
- JPH03103442U JPH03103442U JP1097590U JP1097590U JPH03103442U JP H03103442 U JPH03103442 U JP H03103442U JP 1097590 U JP1097590 U JP 1097590U JP 1097590 U JP1097590 U JP 1097590U JP H03103442 U JPH03103442 U JP H03103442U
- Authority
- JP
- Japan
- Prior art keywords
- glass
- coated
- emulsion layer
- photomask
- glass material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims description 7
- 239000000839 emulsion Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は本考案の１実施例の斜視図、第２図は
第１図の要部拡大断面図、第３図は本考案の第２
の実施例の要部拡大断面図、第４図は、ハレーシ
ヨンによるカブリの説明図、第５図は従来のガラ
ス乾板の断面図である。
図中、１……フオトマスク用ガラス乾板、３…
…感光乳剤層、４……ガラス材、５……無乳剤帯
。
Figure 1 is a perspective view of one embodiment of the present invention, Figure 2 is an enlarged sectional view of the main part of Figure 1, and Figure 3 is a second embodiment of the present invention.
FIG. 4 is an explanatory diagram of fog due to halation, and FIG. 5 is a sectional view of a conventional glass dry plate. In the figure, 1... glass dry plate for photomask, 3...
...Photosensitive emulsion layer, 4...Glass material, 5...Emulsion-free zone.
Claims (1)
ント基板製造工程に用いるフオトマスク用ガラス
乾板１において、 上記ガラス材４表面の周縁部に感光乳剤層３を
塗布しない無乳剤帯５を形成したことを特徴とす
るフオトマスク用ガラス乾板。[Claims for Utility Model Registration] In the glass drying plate 1 for a photomask used in the printed circuit board manufacturing process in which a photosensitive emulsion layer 3 is coated on the surface of the glass material 4, the photosensitive emulsion layer 3 is not coated on the periphery of the surface of the glass material 4. A glass dry plate for a photomask, characterized in that an emulsion zone 5 is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1097590U JPH03103442U (en) | 1990-02-05 | 1990-02-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1097590U JPH03103442U (en) | 1990-02-05 | 1990-02-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03103442U true JPH03103442U (en) | 1991-10-28 |
Family
ID=31514522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1097590U Pending JPH03103442U (en) | 1990-02-05 | 1990-02-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03103442U (en) |
-
1990
- 1990-02-05 JP JP1097590U patent/JPH03103442U/ja active Pending
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