JPS61123570U - - Google Patents

Info

Publication number
JPS61123570U
JPS61123570U JP541785U JP541785U JPS61123570U JP S61123570 U JPS61123570 U JP S61123570U JP 541785 U JP541785 U JP 541785U JP 541785 U JP541785 U JP 541785U JP S61123570 U JPS61123570 U JP S61123570U
Authority
JP
Japan
Prior art keywords
adhesive layer
plastic film
rigidity
utility
elastic modulus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP541785U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP541785U priority Critical patent/JPS61123570U/ja
Publication of JPS61123570U publication Critical patent/JPS61123570U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案マスクの縦断面図である。 1…プラスチツクフイルム、2…マスクパター
ン孔、3…粘着層。
The drawing is a longitudinal cross-sectional view of the mask of the present invention. 1...Plastic film, 2...Mask pattern hole, 3...Adhesive layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 弾性率200Kg/mm以上の剛性を有するプラ
スチツクフイルムからなり、該フイルムに所望形
状の回路パターンを穿設するとともにその一面に
粘着層を設けたことを特徴とする回路形成用マス
ク。
1. A circuit forming mask comprising a plastic film having a rigidity with an elastic modulus of 200 Kg/mm 2 or more, which has a circuit pattern of a desired shape perforated therein and an adhesive layer provided on one surface thereof.
JP541785U 1985-01-21 1985-01-21 Pending JPS61123570U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP541785U JPS61123570U (en) 1985-01-21 1985-01-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP541785U JPS61123570U (en) 1985-01-21 1985-01-21

Publications (1)

Publication Number Publication Date
JPS61123570U true JPS61123570U (en) 1986-08-04

Family

ID=30481908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP541785U Pending JPS61123570U (en) 1985-01-21 1985-01-21

Country Status (1)

Country Link
JP (1) JPS61123570U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011511345A (en) * 2008-01-23 2011-04-07 タジェオ Wireless identification element manufacturing method and wireless identification element obtained by the method
WO2013039196A1 (en) * 2011-09-16 2013-03-21 株式会社ブイ・テクノロジー Vapor-deposition mask, vapor-deposition mask manufacturing method, and thin-film pattern forming method
JP2013108143A (en) * 2011-11-22 2013-06-06 V Technology Co Ltd Manufacturing method of mask and manufacturing device of mask
JP2013173968A (en) * 2012-02-24 2013-09-05 V Technology Co Ltd Vapor-deposition mask, and method for manufacturing vapor-deposition mask
US9334556B2 (en) 2011-09-16 2016-05-10 V Technology Co., Ltd. Deposition mask, producing method therefor and forming method for thin film pattern

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011511345A (en) * 2008-01-23 2011-04-07 タジェオ Wireless identification element manufacturing method and wireless identification element obtained by the method
JP2014067450A (en) * 2008-01-23 2014-04-17 Tageos Method for manufacturing radio identification element, and radio identification element obtained by the method
JP2016194934A (en) * 2008-01-23 2016-11-17 タジェオTageos Method for manufacturing radio identification element, and radio identification element obtained by the method
WO2013039196A1 (en) * 2011-09-16 2013-03-21 株式会社ブイ・テクノロジー Vapor-deposition mask, vapor-deposition mask manufacturing method, and thin-film pattern forming method
US9334556B2 (en) 2011-09-16 2016-05-10 V Technology Co., Ltd. Deposition mask, producing method therefor and forming method for thin film pattern
US9555433B2 (en) 2011-09-16 2017-01-31 V Technology Co., Ltd. Deposition mask, producing method therefor and forming method for thin film pattern
US9555434B2 (en) 2011-09-16 2017-01-31 V Technology Co., Ltd. Deposition mask, producing method therefor and forming method for thin film pattern
US9586225B2 (en) 2011-09-16 2017-03-07 V Technology Co., Ltd. Deposition mask, producing method therefor and forming method for thin film pattern
JP2013108143A (en) * 2011-11-22 2013-06-06 V Technology Co Ltd Manufacturing method of mask and manufacturing device of mask
JP2013173968A (en) * 2012-02-24 2013-09-05 V Technology Co Ltd Vapor-deposition mask, and method for manufacturing vapor-deposition mask

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