JPH0183337U - - Google Patents
Info
- Publication number
- JPH0183337U JPH0183337U JP1987179795U JP17979587U JPH0183337U JP H0183337 U JPH0183337 U JP H0183337U JP 1987179795 U JP1987179795 U JP 1987179795U JP 17979587 U JP17979587 U JP 17979587U JP H0183337 U JPH0183337 U JP H0183337U
- Authority
- JP
- Japan
- Prior art keywords
- chuck
- contact aligner
- substrate
- main plane
- lowered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Description
第１図は、本考案の一実施例を示すものであつ
て、第１図イはチヤツク上面から見た説明図、第
１図ロは側面から見た断面説明図である。第２図
は回転塗布方法により基板上面にレジスト膜を形
成した場合の状態を示す断面説明図である。第３
図は、従来のコンタクトアライナー用チヤツクの
上面に、レジスト膜を形成した基板を吸着させて
保持した後、該基板上面にマスクを密着させた状
態を示す断面説明図であり、第４図は、本考案に
よるコンタクトアライナー用チヤツクを用いた場
合の、前記状態を示す断面説明図である。又第５
図は、本考案の他の実施例を示す断面説明図であ
る。
１……コンタクトアライナー用チヤツク、２…
…チヤツク周辺部の下降部分、３……基板、４…
…レジスト膜、５……基板裏面に付着したレジス
ト、６……マスク。
FIG. 1 shows an embodiment of the present invention, in which FIG. 1A is an explanatory view as seen from the top surface of the chuck, and FIG. 1B is an explanatory cross-sectional view as seen from the side. FIG. 2 is an explanatory cross-sectional view showing a state in which a resist film is formed on the upper surface of a substrate by a spin coating method. Third
The figure is an explanatory cross-sectional view showing a state in which a substrate on which a resist film is formed is adsorbed and held on the top surface of a conventional contact aligner chuck, and then a mask is brought into close contact with the top surface of the substrate. FIG. 2 is an explanatory cross-sectional view showing the above state when the contact aligner chuck according to the present invention is used. Also the fifth
The figure is a cross-sectional explanatory view showing another embodiment of the present invention. 1...Chuck for contact aligner, 2...
...Descent portion around the chuck, 3... Board, 4...
...Resist film, 5...Resist attached to the back surface of the substrate, 6...Mask.
Claims (1)
を設けるにあたり、該基板を吸着して保持させる
コンタクトアライナー用チヤツクにおいて、該チ
ヤツクの上面周辺部が主平面と比較して下降した
面をもつ事を特徴とするコンタクトアライナー用
チヤツク。 (2) 下降した面が外周方向に向かつて下降する
傾斜面である実用新案登録請求の範囲第１項記載
のコンタクトアライナー用チヤツク。 (3) 下降した面が主平面と比較して下降した段
差面である実用新案登録請求の範囲第１項記載の
コンタクトアライナー用チヤツク。[Scope of Claim for Utility Model Registration] (1) When forming an exposure pattern on a substrate on which a resist film is formed, in a chuck for a contact aligner that attracts and holds the substrate, the upper peripheral part of the chuck is compared with the main plane. A contact aligner chuck characterized by having a descending surface. (2) The contact aligner chuck according to claim 1, wherein the descending surface is an inclined surface that descends toward the outer circumference. (3) The contact aligner chuck according to claim 1, wherein the lowered surface is a stepped surface lowered compared to the main plane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987179795U JPH0183337U (en) | 1987-11-26 | 1987-11-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987179795U JPH0183337U (en) | 1987-11-26 | 1987-11-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0183337U true JPH0183337U (en) | 1989-06-02 |
Family
ID=31471337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987179795U Pending JPH0183337U (en) | 1987-11-26 | 1987-11-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0183337U (en) |
-
1987
- 1987-11-26 JP JP1987179795U patent/JPH0183337U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0183337U (en) | ||
| JPS6039047U (en) | mask blank board | |
| JPH0316152U (en) | ||
| JPS6445841U (en) | ||
| JPS63187147U (en) | ||
| JPH025754U (en) | ||
| JPS59146944U (en) | wahachishaku base | |
| JPS6088338U (en) | photo mask | |
| JPS58419U (en) | reticle | |
| JPH02125966U (en) | ||
| JPS6449841U (en) | ||
| JPS58168422U (en) | Decorative base material with metallic luster pattern | |
| JPH0291349U (en) | ||
| JPS59109349U (en) | photomask substrate | |
| JPH0247649U (en) | ||
| JPH0252327U (en) | ||
| JPS6319842U (en) | ||
| JPS6166940U (en) | ||
| JPS63170949U (en) | ||
| JPH0278946U (en) | ||
| JPH044055U (en) | ||
| JPS62161250U (en) | ||
| JPS63140525U (en) | ||
| JPH0173848U (en) | ||
| JPH0278947U (en) |