JPS59146944U - wahachishaku base - Google Patents

wahachishaku base

Info

Publication number
JPS59146944U
JPS59146944U JP3959683U JP3959683U JPS59146944U JP S59146944 U JPS59146944 U JP S59146944U JP 3959683 U JP3959683 U JP 3959683U JP 3959683 U JP3959683 U JP 3959683U JP S59146944 U JPS59146944 U JP S59146944U
Authority
JP
Japan
Prior art keywords
base
wahachishaku
wafer
edge portion
chuck base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3959683U
Other languages
Japanese (ja)
Inventor
良一 松本
Original Assignee
沖電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 沖電気工業株式会社 filed Critical 沖電気工業株式会社
Priority to JP3959683U priority Critical patent/JPS59146944U/en
Publication of JPS59146944U publication Critical patent/JPS59146944U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のウェハチャック基台の平面図及び断面側
面図、第2図a ”−eは従来のウェハチャック基台の
ウェハエッヂ部を示す断面図、第3図は本考案の一実施
例の平面図及び断面側面図、第4図a−cは本考案を実
施したウェハチャック基台のウェハエッヂ部を示す断面
図である。 1・・・プレート、2・・・孔、3・・・ウェハ、4・
・・異物、5・・・溝。
Figure 1 is a plan view and a cross-sectional side view of a conventional wafer chuck base, Figure 2 a''-e is a cross-sectional view showing the wafer edge portion of a conventional wafer chuck base, and Figure 3 is an embodiment of the present invention. 4A to 4C are cross-sectional views showing the wafer edge portion of the wafer chuck base in which the present invention is implemented. Wafer, 4.
... Foreign matter, 5... Groove.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体集積回路の微細パターン形成に用いるマスクアラ
イナのウェハチャック基台において、装着されるウェハ
のエッヂ部分が位置するプレート上面に溝を設けたこと
を特徴とするウェハチャック基台。
A wafer chuck base for a mask aligner used for forming fine patterns of semiconductor integrated circuits, characterized in that a groove is provided in the upper surface of a plate where an edge portion of a wafer to be mounted is located.
JP3959683U 1983-03-22 1983-03-22 wahachishaku base Pending JPS59146944U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3959683U JPS59146944U (en) 1983-03-22 1983-03-22 wahachishaku base

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3959683U JPS59146944U (en) 1983-03-22 1983-03-22 wahachishaku base

Publications (1)

Publication Number Publication Date
JPS59146944U true JPS59146944U (en) 1984-10-01

Family

ID=30170234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3959683U Pending JPS59146944U (en) 1983-03-22 1983-03-22 wahachishaku base

Country Status (1)

Country Link
JP (1) JPS59146944U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1050810A (en) * 1997-04-07 1998-02-20 Nikon Corp Suction device for substrate and aligner

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5936245B2 (en) * 1977-07-20 1984-09-03 インタ−ナショナル・スタンダ−ド・エレクトリック・コ−ポレ−ション Nematic liquid crystal display cell

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5936245B2 (en) * 1977-07-20 1984-09-03 インタ−ナショナル・スタンダ−ド・エレクトリック・コ−ポレ−ション Nematic liquid crystal display cell

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1050810A (en) * 1997-04-07 1998-02-20 Nikon Corp Suction device for substrate and aligner

Similar Documents

Publication Publication Date Title
JPS6088535U (en) semiconductor wafer
JPS59146944U (en) wahachishaku base
JPS61238U (en) Alignment mark for semiconductor devices
JPS6096831U (en) semiconductor chip
JPS6037239U (en) semiconductor wafer
JPS596834U (en) silicon wafer
JPS5998445U (en) photomask
JPS60183434U (en) Wafer for integrated circuit formation
JPS6088338U (en) photo mask
JPS5825039U (en) semiconductor substrate
JPS63164231U (en)
JPS5983029U (en) semiconductor substrate
JPS59115641U (en) Circuit board mold flow prevention structure
JPS60183435U (en) Semiconductor substrate growth equipment
JPS6448040U (en)
JPS6013739U (en) Wafer holding device
JPS6445841U (en)
JPS6418778U (en)
JPS6122339U (en) semiconductor wafer
JPS5846442U (en) Plane positioning device
JPS59104540U (en) Ceramic chip carrier
JPS62151747U (en)
JPS6192065U (en)
JPS5981073U (en) Substrate holding structure
JPS60178838U (en) Masks for semiconductor device manufacturing