JPH047183Y2 - - Google Patents
Info
- Publication number
- JPH047183Y2 JPH047183Y2 JP6437485U JP6437485U JPH047183Y2 JP H047183 Y2 JPH047183 Y2 JP H047183Y2 JP 6437485 U JP6437485 U JP 6437485U JP 6437485 U JP6437485 U JP 6437485U JP H047183 Y2 JPH047183 Y2 JP H047183Y2
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- substrate
- substrate holder
- shutter plate
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 34
- 238000004544 sputter deposition Methods 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 238000002161 passivation Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6437485U JPH047183Y2 (enrdf_load_stackoverflow) | 1985-04-30 | 1985-04-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6437485U JPH047183Y2 (enrdf_load_stackoverflow) | 1985-04-30 | 1985-04-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61179745U JPS61179745U (enrdf_load_stackoverflow) | 1986-11-10 |
| JPH047183Y2 true JPH047183Y2 (enrdf_load_stackoverflow) | 1992-02-26 |
Family
ID=30595400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6437485U Expired JPH047183Y2 (enrdf_load_stackoverflow) | 1985-04-30 | 1985-04-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH047183Y2 (enrdf_load_stackoverflow) |
-
1985
- 1985-04-30 JP JP6437485U patent/JPH047183Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61179745U (enrdf_load_stackoverflow) | 1986-11-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20020166762A1 (en) | Physical vapor deposition apparatus with modified shutter disk and cover ring | |
| US5248402A (en) | Apple-shaped magnetron for sputtering system | |
| EP0504374A1 (en) | Static control overlayers on opto-electronic devices | |
| JPH047183Y2 (enrdf_load_stackoverflow) | ||
| GB1465367A (en) | Method of manufacturing light sensitive heterodiode | |
| GB1212114A (en) | Negative-temperature-coefficient resistors | |
| JPH0676658B2 (ja) | スパツタリング装置 | |
| JPS5846195B2 (ja) | 密着形イメ−ジセンサの製造方法 | |
| JPH0513287B2 (enrdf_load_stackoverflow) | ||
| JPS59179783A (ja) | スパツタリングタ−ゲツト | |
| JPH0768614B2 (ja) | カルーセル形スパツタリング装置およびそのスパツタリング方法 | |
| JP2000265261A (ja) | 真空蒸着装置 | |
| JP2632671B2 (ja) | 光デイスクの製造方法 | |
| JPH0513442A (ja) | 半導体基板 | |
| JPS6328988B2 (enrdf_load_stackoverflow) | ||
| JPH0419650B2 (enrdf_load_stackoverflow) | ||
| JPH0720312A (ja) | 光学フィルター | |
| JP4378017B2 (ja) | 光ディスク用スパッタ装置 | |
| JPS6348632A (ja) | 光学情報記録再生デイスクの製造方法 | |
| JPH04157720A (ja) | スパッタリング方法 | |
| CN113675722A (zh) | 一种Cap layer层蚀刻优化方法 | |
| JP2994659B2 (ja) | 多結晶半導体装置及びその製造方法 | |
| JPH03120874A (ja) | 透明電極パターン形成方法 | |
| JPS6244930A (ja) | 撮像管タ−ゲツトの製造装置 | |
| JPH0729884A (ja) | 基板表面のイオンエッチング処理および薄膜形成方法 |