JPH047182Y2 - - Google Patents

Info

Publication number
JPH047182Y2
JPH047182Y2 JP1987186215U JP18621587U JPH047182Y2 JP H047182 Y2 JPH047182 Y2 JP H047182Y2 JP 1987186215 U JP1987186215 U JP 1987186215U JP 18621587 U JP18621587 U JP 18621587U JP H047182 Y2 JPH047182 Y2 JP H047182Y2
Authority
JP
Japan
Prior art keywords
crucible
crucibles
support plate
temperature
evaporation source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1987186215U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0189953U (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987186215U priority Critical patent/JPH047182Y2/ja
Publication of JPH0189953U publication Critical patent/JPH0189953U/ja
Application granted granted Critical
Publication of JPH047182Y2 publication Critical patent/JPH047182Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1987186215U 1987-12-07 1987-12-07 Expired JPH047182Y2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987186215U JPH047182Y2 (fr) 1987-12-07 1987-12-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987186215U JPH047182Y2 (fr) 1987-12-07 1987-12-07

Publications (2)

Publication Number Publication Date
JPH0189953U JPH0189953U (fr) 1989-06-13
JPH047182Y2 true JPH047182Y2 (fr) 1992-02-26

Family

ID=31477454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987186215U Expired JPH047182Y2 (fr) 1987-12-07 1987-12-07

Country Status (1)

Country Link
JP (1) JPH047182Y2 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725734B2 (fr) * 1972-03-30 1982-05-31
JPS5943875A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発源及びその使用方法
JPS60255971A (ja) * 1984-05-30 1985-12-17 Mitsubishi Electric Corp 薄膜形成装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725734U (fr) * 1980-07-18 1982-02-10

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725734B2 (fr) * 1972-03-30 1982-05-31
JPS5943875A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発源及びその使用方法
JPS60255971A (ja) * 1984-05-30 1985-12-17 Mitsubishi Electric Corp 薄膜形成装置

Also Published As

Publication number Publication date
JPH0189953U (fr) 1989-06-13

Similar Documents

Publication Publication Date Title
US5352864A (en) Process and device for output control and limitation in a heating surface made from glass ceramic or a comparable material
US5059770A (en) Multi-zone planar heater assembly and method of operation
JP4495340B2 (ja) ウェーハ温度ランピング中でのウェーハの放射状温度勾配制御方法および装置
JPH0443414B2 (fr)
JP6013467B2 (ja) 結晶成長装置用の加熱部品
JPH036367A (ja) 真空蒸着器における蒸着基板加熱装置ならびにボートの支持構造
JPH047182Y2 (fr)
JPS63216283A (ja) 加熱装置
JPH01159369A (ja) 真空蒸着装置
EP3494243B1 (fr) Source d'évaporation linéaire homogène présentant un dispositif de chauffage
JP2013067845A (ja) 蒸着材料加熱装置、蒸着装置、蒸着方法、基板
CN211471547U (zh) 加热器
JPS55122870A (en) Vacuum vapor deposition method
JPH0338029A (ja) 気相成長装置
US10982319B2 (en) Homogeneous linear evaporation source
JPH0770739A (ja) 蒸着用るつぼの温度制御装置
JPH0735382Y2 (ja) 薄膜気相成長装置
JPS6298610A (ja) 結晶成長用基板加熱機構
JPH11340236A (ja) 基板加熱装置
JPH0625920Y2 (ja) 誘導加熱調理器のトッププレート
JPH04157717A (ja) 気相成長用ウエハ加熱装置
JPH03252127A (ja) 気相成長装置の温度制御方法
KR101002939B1 (ko) 히터의 다중 온도 제어시스템
CN115341179A (zh) 一种用于oled蒸镀的蒸发源结构
JP2579468Y2 (ja) 極超高温加熱炉