JPH0464063B2 - - Google Patents

Info

Publication number
JPH0464063B2
JPH0464063B2 JP59279233A JP27923384A JPH0464063B2 JP H0464063 B2 JPH0464063 B2 JP H0464063B2 JP 59279233 A JP59279233 A JP 59279233A JP 27923384 A JP27923384 A JP 27923384A JP H0464063 B2 JPH0464063 B2 JP H0464063B2
Authority
JP
Japan
Prior art keywords
photosensitive
free radical
composition
general formula
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59279233A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61151644A (ja
Inventor
Akira Nagashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP27923384A priority Critical patent/JPS61151644A/ja
Publication of JPS61151644A publication Critical patent/JPS61151644A/ja
Publication of JPH0464063B2 publication Critical patent/JPH0464063B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP27923384A 1984-12-26 1984-12-26 感光性組成物 Granted JPS61151644A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27923384A JPS61151644A (ja) 1984-12-26 1984-12-26 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27923384A JPS61151644A (ja) 1984-12-26 1984-12-26 感光性組成物

Publications (2)

Publication Number Publication Date
JPS61151644A JPS61151644A (ja) 1986-07-10
JPH0464063B2 true JPH0464063B2 (US08088918-20120103-C00476.png) 1992-10-13

Family

ID=17608287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27923384A Granted JPS61151644A (ja) 1984-12-26 1984-12-26 感光性組成物

Country Status (1)

Country Link
JP (1) JPS61151644A (US08088918-20120103-C00476.png)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2599003B2 (ja) * 1989-10-16 1997-04-09 富士写真フイルム株式会社 感光性組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP2566098B2 (ja) * 1992-05-01 1996-12-25 東京応化工業株式会社 ネガ型放射線感応性レジスト組成物
ATE439235T1 (de) 1999-05-21 2009-08-15 Fujifilm Corp Lichtempfindliche zusammensetzung und flachdruckplattenbasis damit
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP1211065B1 (en) 2000-11-30 2009-01-14 FUJIFILM Corporation Planographic printing plate precursor
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
ATE532106T1 (de) 2002-09-20 2011-11-15 Fujifilm Corp Verfahren zur herstellung einer flachdruckplatte
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
US8196312B2 (en) 2006-05-18 2012-06-12 Fujifilm Corporation Drying method and apparatus for drying object
JP5238292B2 (ja) 2007-03-23 2013-07-17 三菱製紙株式会社 水現像可能な感光性平版印刷版材料
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
US8883401B2 (en) 2009-09-24 2014-11-11 Fujifilm Corporation Lithographic printing original plate
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5253433B2 (ja) 2010-02-19 2013-07-31 富士フイルム株式会社 平版印刷版の作製方法
WO2011122473A1 (ja) 2010-03-29 2011-10-06 三菱製紙株式会社 感光性組成物及び感光性平版印刷版材料
WO2011125913A1 (ja) 2010-03-31 2011-10-13 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474887A (en) * 1977-11-29 1979-06-15 Fuji Photo Film Co Ltd Photo-polymerizable composition
JPS5887553A (ja) * 1981-11-09 1983-05-25 ヘキスト・アクチエンゲゼルシヤフト 感光性混合物及び該混合物より製造した感光性複写材料
JPS60239736A (ja) * 1984-05-14 1985-11-28 Fuji Photo Film Co Ltd 感光性組成物
JPS61123602A (ja) * 1984-11-19 1986-06-11 Mitsubishi Chem Ind Ltd 光重合性組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474887A (en) * 1977-11-29 1979-06-15 Fuji Photo Film Co Ltd Photo-polymerizable composition
JPS5887553A (ja) * 1981-11-09 1983-05-25 ヘキスト・アクチエンゲゼルシヤフト 感光性混合物及び該混合物より製造した感光性複写材料
JPS60239736A (ja) * 1984-05-14 1985-11-28 Fuji Photo Film Co Ltd 感光性組成物
JPS61123602A (ja) * 1984-11-19 1986-06-11 Mitsubishi Chem Ind Ltd 光重合性組成物

Also Published As

Publication number Publication date
JPS61151644A (ja) 1986-07-10

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Legal Events

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