JPH0463154B2 - - Google Patents

Info

Publication number
JPH0463154B2
JPH0463154B2 JP61312155A JP31215586A JPH0463154B2 JP H0463154 B2 JPH0463154 B2 JP H0463154B2 JP 61312155 A JP61312155 A JP 61312155A JP 31215586 A JP31215586 A JP 31215586A JP H0463154 B2 JPH0463154 B2 JP H0463154B2
Authority
JP
Japan
Prior art keywords
sample
plasma
plasma cvd
deposition
reaction vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61312155A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63166972A (ja
Inventor
Yoichi Oonishi
Mikio Takebayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61312155A priority Critical patent/JPS63166972A/ja
Publication of JPS63166972A publication Critical patent/JPS63166972A/ja
Publication of JPH0463154B2 publication Critical patent/JPH0463154B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP61312155A 1986-12-26 1986-12-26 プラズマcvd方法 Granted JPS63166972A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61312155A JPS63166972A (ja) 1986-12-26 1986-12-26 プラズマcvd方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61312155A JPS63166972A (ja) 1986-12-26 1986-12-26 プラズマcvd方法

Publications (2)

Publication Number Publication Date
JPS63166972A JPS63166972A (ja) 1988-07-11
JPH0463154B2 true JPH0463154B2 (enExample) 1992-10-08

Family

ID=18025903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61312155A Granted JPS63166972A (ja) 1986-12-26 1986-12-26 プラズマcvd方法

Country Status (1)

Country Link
JP (1) JPS63166972A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5229585A (en) * 1991-02-19 1993-07-20 Minnesota Mining And Manufacturing Company Film cartridge bar code scanner and controller for a digital imaging system
FR2847713B1 (fr) * 2002-11-21 2005-03-18 Cit Alcatel Dispositif et procede de nettoyage des chambres de procedes et lignes de vide
CN105112885B (zh) * 2015-08-31 2018-01-26 清远先导材料有限公司 一种带有清料装置的化学气相沉积炉

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS591673A (ja) * 1982-06-25 1984-01-07 Toshiba Corp 薄膜形成装置
JPS6134931A (ja) * 1984-07-26 1986-02-19 Canon Inc シリコン膜の製造方法

Also Published As

Publication number Publication date
JPS63166972A (ja) 1988-07-11

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