JPH0458168B2 - - Google Patents
Info
- Publication number
- JPH0458168B2 JPH0458168B2 JP58214499A JP21449983A JPH0458168B2 JP H0458168 B2 JPH0458168 B2 JP H0458168B2 JP 58214499 A JP58214499 A JP 58214499A JP 21449983 A JP21449983 A JP 21449983A JP H0458168 B2 JPH0458168 B2 JP H0458168B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- pattern
- resist film
- resist
- pattern forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58214499A JPS60106132A (ja) | 1983-11-15 | 1983-11-15 | パタ−ン形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58214499A JPS60106132A (ja) | 1983-11-15 | 1983-11-15 | パタ−ン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60106132A JPS60106132A (ja) | 1985-06-11 |
JPH0458168B2 true JPH0458168B2 (en, 2012) | 1992-09-16 |
Family
ID=16656717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58214499A Granted JPS60106132A (ja) | 1983-11-15 | 1983-11-15 | パタ−ン形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60106132A (en, 2012) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3432821B2 (ja) | 1991-06-27 | 2003-08-04 | 日本放送協会 | 広帯域カラー画像信号送信装置および受信装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5636134A (en) * | 1979-09-03 | 1981-04-09 | Oki Electric Ind Co Ltd | Forming method for pattern of semiconductor substrate |
JPS5834921A (ja) * | 1981-08-27 | 1983-03-01 | Nec Corp | 半導体装置の製造方法 |
-
1983
- 1983-11-15 JP JP58214499A patent/JPS60106132A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60106132A (ja) | 1985-06-11 |
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