JPH0458168B2 - - Google Patents

Info

Publication number
JPH0458168B2
JPH0458168B2 JP58214499A JP21449983A JPH0458168B2 JP H0458168 B2 JPH0458168 B2 JP H0458168B2 JP 58214499 A JP58214499 A JP 58214499A JP 21449983 A JP21449983 A JP 21449983A JP H0458168 B2 JPH0458168 B2 JP H0458168B2
Authority
JP
Japan
Prior art keywords
film
pattern
resist film
resist
pattern forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58214499A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60106132A (ja
Inventor
Kazumasa Shigematsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58214499A priority Critical patent/JPS60106132A/ja
Publication of JPS60106132A publication Critical patent/JPS60106132A/ja
Publication of JPH0458168B2 publication Critical patent/JPH0458168B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58214499A 1983-11-15 1983-11-15 パタ−ン形成方法 Granted JPS60106132A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58214499A JPS60106132A (ja) 1983-11-15 1983-11-15 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58214499A JPS60106132A (ja) 1983-11-15 1983-11-15 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS60106132A JPS60106132A (ja) 1985-06-11
JPH0458168B2 true JPH0458168B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-09-16

Family

ID=16656717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58214499A Granted JPS60106132A (ja) 1983-11-15 1983-11-15 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS60106132A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993000771A1 (en) 1991-06-27 1993-01-07 Nippon Hoso Kyokai Sub-sampling transmission system for improving transmitted picture quality in time-varying picture region of wide-band color picture signal

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636134A (en) * 1979-09-03 1981-04-09 Oki Electric Ind Co Ltd Forming method for pattern of semiconductor substrate
JPS5834921A (ja) * 1981-08-27 1983-03-01 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS60106132A (ja) 1985-06-11

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