JPH0456454B2 - - Google Patents
Info
- Publication number
- JPH0456454B2 JPH0456454B2 JP58100823A JP10082383A JPH0456454B2 JP H0456454 B2 JPH0456454 B2 JP H0456454B2 JP 58100823 A JP58100823 A JP 58100823A JP 10082383 A JP10082383 A JP 10082383A JP H0456454 B2 JPH0456454 B2 JP H0456454B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electron beam
- annealing
- photodetector
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58100823A JPS59227130A (ja) | 1983-06-08 | 1983-06-08 | 電子ビ−ムアニ−ル装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58100823A JPS59227130A (ja) | 1983-06-08 | 1983-06-08 | 電子ビ−ムアニ−ル装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59227130A JPS59227130A (ja) | 1984-12-20 |
JPH0456454B2 true JPH0456454B2 (enrdf_load_html_response) | 1992-09-08 |
Family
ID=14284048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58100823A Granted JPS59227130A (ja) | 1983-06-08 | 1983-06-08 | 電子ビ−ムアニ−ル装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59227130A (enrdf_load_html_response) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS584257A (ja) * | 1981-06-30 | 1983-01-11 | Toshiba Corp | 走査型電子ビ−ムアニ−ル装置 |
-
1983
- 1983-06-08 JP JP58100823A patent/JPS59227130A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59227130A (ja) | 1984-12-20 |
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