JPH0451917B2 - - Google Patents
Info
- Publication number
- JPH0451917B2 JPH0451917B2 JP9569185A JP9569185A JPH0451917B2 JP H0451917 B2 JPH0451917 B2 JP H0451917B2 JP 9569185 A JP9569185 A JP 9569185A JP 9569185 A JP9569185 A JP 9569185A JP H0451917 B2 JPH0451917 B2 JP H0451917B2
- Authority
- JP
- Japan
- Prior art keywords
- memory
- memory cell
- bit line
- transistor
- injector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007667 floating Methods 0.000 claims description 23
- 239000004065 semiconductor Substances 0.000 claims description 21
- 239000011159 matrix material Substances 0.000 claims description 18
- 210000004027 cell Anatomy 0.000 description 47
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 210000000352 storage cell Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0483—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
- For Increasing The Reliability Of Semiconductor Memories (AREA)
- Read Only Memory (AREA)
- Static Random-Access Memory (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP84105116A EP0160720B1 (de) | 1984-05-07 | 1984-05-07 | Halbleiterspeicherzelle mit einem potentialmässig schwebenden Speichergate |
EP84105116,2 | 1984-05-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60246099A JPS60246099A (ja) | 1985-12-05 |
JPH0451917B2 true JPH0451917B2 (en, 2012) | 1992-08-20 |
Family
ID=8191928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60095691A Granted JPS60246099A (ja) | 1984-05-07 | 1985-05-07 | 半導体フローテイングゲートメモリセル |
Country Status (5)
Country | Link |
---|---|
US (1) | US4580247A (en, 2012) |
EP (1) | EP0160720B1 (en, 2012) |
JP (1) | JPS60246099A (en, 2012) |
AU (1) | AU4171085A (en, 2012) |
DE (1) | DE3468592D1 (en, 2012) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4787047A (en) * | 1985-03-22 | 1988-11-22 | Intersil | Electrically erasable fused programmable logic array |
US4933904A (en) * | 1985-11-29 | 1990-06-12 | General Electric Company | Dense EPROM having serially coupled floating gate transistors |
US4758988A (en) * | 1985-12-12 | 1988-07-19 | Motorola, Inc. | Dual array EEPROM for high endurance capability |
US5245566A (en) * | 1987-04-24 | 1993-09-14 | Fujio Masuoka | Programmable semiconductor |
US5313420A (en) | 1987-04-24 | 1994-05-17 | Kabushiki Kaisha Toshiba | Programmable semiconductor memory |
US5719805A (en) * | 1987-04-24 | 1998-02-17 | Kabushiki Kaisha Toshiba | Electrically programmable non-volatile semiconductor memory including series connected memory cells and decoder circuitry for applying a ground voltage to non-selected circuit units |
US5008856A (en) * | 1987-06-29 | 1991-04-16 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with NAND cell structure |
US5448517A (en) * | 1987-06-29 | 1995-09-05 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with NAND cell structure |
US6034899A (en) * | 1987-06-29 | 2000-03-07 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US6545913B2 (en) | 1987-06-29 | 2003-04-08 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US5877981A (en) * | 1987-06-29 | 1999-03-02 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device having a matrix of memory cells |
US5270969A (en) * | 1987-06-29 | 1993-12-14 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with nand cell structure |
JP2856395B2 (ja) * | 1987-11-09 | 1999-02-10 | 日本電気アイシーマイコンシステム株式会社 | 半導体集積回路 |
US4939690A (en) * | 1987-12-28 | 1990-07-03 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cell structure that suppresses memory cell threshold voltage variation |
US4845538A (en) * | 1988-02-05 | 1989-07-04 | Emanuel Hazani | E2 prom cell including isolated control diffusion |
US4855955A (en) * | 1988-04-08 | 1989-08-08 | Seeq Technology, Inc. | Three transistor high endurance eeprom cell |
JPH01273350A (ja) * | 1988-04-25 | 1989-11-01 | Nec Corp | 不揮発性半導体記憶装置 |
US5005155A (en) * | 1988-06-15 | 1991-04-02 | Advanced Micro Devices, Inc. | Optimized electrically erasable PLA cell for minimum read disturb |
US5295096A (en) * | 1988-07-11 | 1994-03-15 | Mitsubishi Denki Kabushiki Kaisha | NAND type EEPROM and operating method therefor |
KR910007434B1 (ko) * | 1988-12-15 | 1991-09-26 | 삼성전자 주식회사 | 전기적으로 소거 및 프로그램 가능한 반도체 메모리장치 및 그 소거 및 프로그램 방법 |
KR910004166B1 (ko) * | 1988-12-27 | 1991-06-22 | 삼성전자주식회사 | 낸드쎌들을 가지는 전기적으로 소거 및 프로그램 가능한 반도체 메모리장치 |
JP2580752B2 (ja) * | 1988-12-27 | 1997-02-12 | 日本電気株式会社 | 不揮発性半導体記憶装置 |
JP3060680B2 (ja) * | 1990-11-30 | 2000-07-10 | 日本電気株式会社 | 不揮発性半導体記憶装置 |
JP3342730B2 (ja) * | 1993-03-17 | 2002-11-11 | 富士通株式会社 | 不揮発性半導体記憶装置 |
DE69326154T2 (de) * | 1993-11-30 | 2000-02-24 | Stmicroelectronics S.R.L., Agrate Brianza | Integrierte Schaltung für die Programmierung einer Speicherzelle eines nicht flüchtigen Speicherregisters |
JP3450467B2 (ja) * | 1993-12-27 | 2003-09-22 | 株式会社東芝 | 不揮発性半導体記憶装置及びその製造方法 |
US5889410A (en) * | 1996-05-22 | 1999-03-30 | International Business Machines Corporation | Floating gate interlevel defect monitor and method |
US7450433B2 (en) * | 2004-12-29 | 2008-11-11 | Sandisk Corporation | Word line compensation in non-volatile memory erase operations |
US7522457B2 (en) * | 2005-03-31 | 2009-04-21 | Sandisk Corporation | Systems for erase voltage manipulation in non-volatile memory for controlled shifts in threshold voltage |
US7408804B2 (en) | 2005-03-31 | 2008-08-05 | Sandisk Corporation | Systems for soft programming non-volatile memory utilizing individual verification and additional soft programming of subsets of memory cells |
US7457166B2 (en) * | 2005-03-31 | 2008-11-25 | Sandisk Corporation | Erase voltage manipulation in non-volatile memory for controlled shifts in threshold voltage |
US7535766B2 (en) * | 2006-10-13 | 2009-05-19 | Sandisk Corporation | Systems for partitioned soft programming in non-volatile memory |
US7499317B2 (en) * | 2006-10-13 | 2009-03-03 | Sandisk Corporation | System for partitioned erase and erase verification in a non-volatile memory to compensate for capacitive coupling |
US7495954B2 (en) * | 2006-10-13 | 2009-02-24 | Sandisk Corporation | Method for partitioned erase and erase verification to compensate for capacitive coupling effects in non-volatile memory |
US7499338B2 (en) * | 2006-10-13 | 2009-03-03 | Sandisk Corporation | Partitioned soft programming in non-volatile memory |
JP5467761B2 (ja) * | 2008-12-01 | 2014-04-09 | ローム株式会社 | Eeprom |
JP5301020B2 (ja) * | 2012-07-24 | 2013-09-25 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0053075B1 (en) * | 1980-11-26 | 1988-04-20 | Fujitsu Limited | Nonvolatile memory |
JPS57130298A (en) * | 1981-02-06 | 1982-08-12 | Hitachi Ltd | Semiconductor integrated circuit memory and relieving method for its fault |
-
1984
- 1984-05-07 EP EP84105116A patent/EP0160720B1/de not_active Expired
- 1984-05-07 DE DE8484105116T patent/DE3468592D1/de not_active Expired
-
1985
- 1985-04-26 AU AU41710/85A patent/AU4171085A/en not_active Abandoned
- 1985-05-01 US US06/729,279 patent/US4580247A/en not_active Expired - Lifetime
- 1985-05-07 JP JP60095691A patent/JPS60246099A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
DE3468592D1 (en) | 1988-02-11 |
AU4171085A (en) | 1985-11-14 |
JPS60246099A (ja) | 1985-12-05 |
EP0160720B1 (de) | 1988-01-07 |
EP0160720A1 (de) | 1985-11-13 |
US4580247A (en) | 1986-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |