JPH0449174Y2 - - Google Patents
Info
- Publication number
- JPH0449174Y2 JPH0449174Y2 JP1988003770U JP377088U JPH0449174Y2 JP H0449174 Y2 JPH0449174 Y2 JP H0449174Y2 JP 1988003770 U JP1988003770 U JP 1988003770U JP 377088 U JP377088 U JP 377088U JP H0449174 Y2 JPH0449174 Y2 JP H0449174Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plasma
- discharge
- power supply
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000001939 inductive effect Effects 0.000 claims 1
- 238000005530 etching Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988003770U JPH0449174Y2 (zh) | 1988-01-14 | 1988-01-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988003770U JPH0449174Y2 (zh) | 1988-01-14 | 1988-01-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01110832U JPH01110832U (zh) | 1989-07-26 |
| JPH0449174Y2 true JPH0449174Y2 (zh) | 1992-11-19 |
Family
ID=31205703
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988003770U Expired JPH0449174Y2 (zh) | 1988-01-14 | 1988-01-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0449174Y2 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4179263B2 (ja) | 2004-10-08 | 2008-11-12 | トヨタ自動車株式会社 | 過給機付内燃機関 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55151328A (en) * | 1979-05-16 | 1980-11-25 | Hitachi Ltd | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
-
1988
- 1988-01-14 JP JP1988003770U patent/JPH0449174Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55151328A (en) * | 1979-05-16 | 1980-11-25 | Hitachi Ltd | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01110832U (zh) | 1989-07-26 |
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