JPH01110832U - - Google Patents
Info
- Publication number
- JPH01110832U JPH01110832U JP377088U JP377088U JPH01110832U JP H01110832 U JPH01110832 U JP H01110832U JP 377088 U JP377088 U JP 377088U JP 377088 U JP377088 U JP 377088U JP H01110832 U JPH01110832 U JP H01110832U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- area
- plasma
- discharge
- feeding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001939 inductive effect Effects 0.000 claims 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988003770U JPH0449174Y2 (zh) | 1988-01-14 | 1988-01-14 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988003770U JPH0449174Y2 (zh) | 1988-01-14 | 1988-01-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01110832U true JPH01110832U (zh) | 1989-07-26 |
JPH0449174Y2 JPH0449174Y2 (zh) | 1992-11-19 |
Family
ID=31205703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988003770U Expired JPH0449174Y2 (zh) | 1988-01-14 | 1988-01-14 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0449174Y2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006038730A1 (ja) | 2004-10-08 | 2006-04-13 | Toyota Jidosha Kabushiki Kaisha | 過給機付内燃機関 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55151328A (en) * | 1979-05-16 | 1980-11-25 | Hitachi Ltd | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
-
1988
- 1988-01-14 JP JP1988003770U patent/JPH0449174Y2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55151328A (en) * | 1979-05-16 | 1980-11-25 | Hitachi Ltd | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006038730A1 (ja) | 2004-10-08 | 2006-04-13 | Toyota Jidosha Kabushiki Kaisha | 過給機付内燃機関 |
Also Published As
Publication number | Publication date |
---|---|
JPH0449174Y2 (zh) | 1992-11-19 |