|
JPS63232321A
(ja)
*
|
1987-03-20 |
1988-09-28 |
Canon Inc |
位置合せ方法
|
|
JPS63232326A
(ja)
*
|
1987-03-20 |
1988-09-28 |
Canon Inc |
位置合せ方法
|
|
JPS63232322A
(ja)
*
|
1987-03-20 |
1988-09-28 |
Canon Inc |
位置合せ方法
|
|
JPS63299122A
(ja)
*
|
1987-05-29 |
1988-12-06 |
Canon Inc |
露光装置の位置合せ方法
|
|
JP2517637B2
(ja)
*
|
1988-02-15 |
1996-07-24 |
キヤノン株式会社 |
マ―ク位置検出方法及びそれが適用される装置
|
|
JPH01243419A
(ja)
*
|
1988-03-25 |
1989-09-28 |
Hitachi Ltd |
位置合わせ方法
|
|
JP2711582B2
(ja)
*
|
1990-05-29 |
1998-02-10 |
キヤノン株式会社 |
位置合わせ方法
|
|
JP2698217B2
(ja)
*
|
1991-01-09 |
1998-01-19 |
株式会社日立製作所 |
半導体ウエハの位置合わせ方法
|
|
JP3991165B2
(ja)
*
|
1995-06-20 |
2007-10-17 |
株式会社ニコン |
位置合わせ方法及び露光方法
|
|
JPH09148217A
(ja)
*
|
1995-11-17 |
1997-06-06 |
Mitsubishi Electric Corp |
位置合わせ方法
|
|
JP2663939B2
(ja)
*
|
1996-06-13 |
1997-10-15 |
株式会社ニコン |
位置合わせ方法
|
|
JPH1079333A
(ja)
*
|
1996-09-03 |
1998-03-24 |
Mitsubishi Electric Corp |
位置合わせ方法
|
|
SG88824A1
(en)
|
1996-11-28 |
2002-05-21 |
Nikon Corp |
Projection exposure method
|
|
US6885908B2
(en)
|
1997-02-14 |
2005-04-26 |
Nikon Corporation |
Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method
|
|
JPH10303126A
(ja)
|
1997-02-28 |
1998-11-13 |
Nikon Corp |
移動シーケンスの決定方法
|
|
JP3634563B2
(ja)
*
|
1997-05-09 |
2005-03-30 |
キヤノン株式会社 |
露光方法および装置並びにデバイス製造方法
|
|
US6180289B1
(en)
|
1997-07-23 |
2001-01-30 |
Nikon Corporation |
Projection-microlithography mask with separate mask substrates
|
|
JPH11142121A
(ja)
|
1997-11-11 |
1999-05-28 |
Nikon Corp |
レチクルの歪み計測方法および歪み計測装置
|
|
WO1999026278A1
(en)
|
1997-11-14 |
1999-05-27 |
Nikon Corporation |
Exposure apparatus and method of manufacturing the same, and exposure method
|
|
AU1351199A
(en)
|
1997-12-03 |
1999-06-16 |
Nikon Corporation |
Substrate transferring device and method
|
|
JP2000173897A
(ja)
|
1998-12-08 |
2000-06-23 |
Mitsubishi Electric Corp |
露光精度制御方法、装置および記録媒体
|
|
TW466542B
(en)
|
1999-02-26 |
2001-12-01 |
Nippon Kogaku Kk |
A stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
|
|
JP2000353657A
(ja)
|
1999-06-14 |
2000-12-19 |
Mitsubishi Electric Corp |
露光方法、露光装置およびその露光装置を用いて製造された半導体装置
|
|
US6958808B2
(en)
|
2000-11-16 |
2005-10-25 |
Nikon Corporation |
System and method for resetting a reaction mass assembly of a stage assembly
|
|
US6885430B2
(en)
|
2000-11-16 |
2005-04-26 |
Nikon Corporation |
System and method for resetting a reaction mass assembly of a stage assembly
|
|
US6788385B2
(en)
|
2001-06-21 |
2004-09-07 |
Nikon Corporation |
Stage device, exposure apparatus and method
|
|
TWI338323B
(en)
|
2003-02-17 |
2011-03-01 |
Nikon Corp |
Stage device, exposure device and manufacguring method of devices
|
|
EP1596425A4
(en)
|
2003-02-19 |
2007-08-01 |
Nikon Corp |
Transfer method, exposure method and exposure device, and construction element manufacturing method
|
|
KR20150036786A
(ko)
|
2003-04-09 |
2015-04-07 |
가부시키가이샤 니콘 |
노광 방법 및 장치, 그리고 디바이스 제조 방법
|
|
KR101533206B1
(ko)
|
2003-04-11 |
2015-07-01 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
|
|
JP4437474B2
(ja)
|
2003-06-19 |
2010-03-24 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
JP4552146B2
(ja)
|
2003-08-07 |
2010-09-29 |
株式会社ニコン |
露光方法及び露光装置、ステージ装置、並びにデバイス製造方法
|
|
TW201738932A
(zh)
|
2003-10-09 |
2017-11-01 |
尼康股份有限公司 |
曝光裝置及曝光方法、元件製造方法
|
|
TWI628698B
(zh)
|
2003-10-28 |
2018-07-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造方法
|
|
TWI385414B
(zh)
|
2003-11-20 |
2013-02-11 |
尼康股份有限公司 |
光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
|
|
KR101359514B1
(ko)
|
2004-01-07 |
2014-02-10 |
가부시키가이샤 니콘 |
적층 장치 및 집적 회로 소자의 적층 방법
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
KR101579361B1
(ko)
|
2004-02-04 |
2015-12-21 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
TWI437618B
(zh)
|
2004-02-06 |
2014-05-11 |
尼康股份有限公司 |
偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
|
|
US7728953B2
(en)
|
2004-03-01 |
2010-06-01 |
Nikon Corporation |
Exposure method, exposure system, and substrate processing apparatus
|
|
US7034917B2
(en)
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
|
JP5130714B2
(ja)
|
2004-04-09 |
2013-01-30 |
株式会社ニコン |
移動体の駆動方法、ステージ装置、露光装置、露光方法、及びデバイス製造方法
|
|
US7259828B2
(en)
*
|
2004-05-14 |
2007-08-21 |
Asml Netherlands B.V. |
Alignment system and method and device manufactured thereby
|
|
EP1780786A4
(en)
|
2004-06-07 |
2009-11-25 |
Nikon Corp |
STAGE DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD
|
|
KR20190006080A
(ko)
|
2004-06-09 |
2019-01-16 |
가부시키가이샤 니콘 |
기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
|
|
CN100479097C
(zh)
|
2004-08-19 |
2009-04-15 |
株式会社尼康 |
对准信息显示方法及其程序、对准方法、曝光方法、组件制造方法、显示系统、显示装置、程序及测定/检查装置
|
|
JP2006140204A
(ja)
*
|
2004-11-10 |
2006-06-01 |
Nikon Corp |
計測条件の最適化方法、該最適化方法を使用した位置計測方法、該位置計測方法を使用した位置合わせ方法、該位置合わせ方法を使用したデバイス製造方法、計測条件の最適化システム、該最適化システムを使用した位置計測装置及び該位置計測装置を使用した露光装置
|
|
US7557529B2
(en)
|
2005-01-11 |
2009-07-07 |
Nikon Corporation |
Stage unit and exposure apparatus
|
|
JP4872916B2
(ja)
|
2005-04-18 |
2012-02-08 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
|
KR101544336B1
(ko)
|
2005-05-12 |
2015-08-12 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
|
JP2006339303A
(ja)
*
|
2005-05-31 |
2006-12-14 |
Nikon Corp |
露光装置、露光方法及びデバイスの製造方法
|
|
WO2007055237A1
(ja)
|
2005-11-09 |
2007-05-18 |
Nikon Corporation |
露光装置及び露光方法、並びにデバイス製造方法
|
|
EP1975981A1
(en)
*
|
2005-12-28 |
2008-10-01 |
Nikon Corporation |
Pattern formation method, pattern formation device, and device fabrication method
|
|
CN101326617B
(zh)
|
2005-12-28 |
2012-06-20 |
株式会社尼康 |
图案形成方法及图案形成装置、以及元件制造方法
|
|
US8411271B2
(en)
|
2005-12-28 |
2013-04-02 |
Nikon Corporation |
Pattern forming method, pattern forming apparatus, and device manufacturing method
|
|
TW201901745A
(zh)
|
2006-01-19 |
2019-01-01 |
日商尼康股份有限公司 |
曝光裝置及曝光方法、以及元件製造方法
|
|
WO2007094431A1
(ja)
|
2006-02-16 |
2007-08-23 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法
|
|
KR20080102192A
(ko)
|
2006-02-16 |
2008-11-24 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
EP1990828A4
(en)
|
2006-02-16 |
2010-09-15 |
Nikon Corp |
EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
|
|
US8134681B2
(en)
|
2006-02-17 |
2012-03-13 |
Nikon Corporation |
Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
|
|
EP2003681B1
(en)
|
2006-02-21 |
2014-11-12 |
Nikon Corporation |
Measuring apparatus, measuring method, pattern forming apparatus, pattern forming method, and device manufacturing method
|
|
KR20130057496A
(ko)
|
2006-02-21 |
2013-05-31 |
가부시키가이샤 니콘 |
패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
|
|
KR101346581B1
(ko)
|
2006-02-21 |
2014-01-02 |
가부시키가이샤 니콘 |
패턴 형성 장치 및 패턴 형성 방법, 이동체 구동 시스템 및이동체 구동 방법, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
|
|
WO2007102484A1
(ja)
|
2006-03-07 |
2007-09-13 |
Nikon Corporation |
デバイス製造方法、デバイス製造システム及び測定検査装置
|
|
TWI454859B
(zh)
|
2006-03-30 |
2014-10-01 |
尼康股份有限公司 |
移動體裝置、曝光裝置與曝光方法以及元件製造方法
|
|
US8125613B2
(en)
|
2006-04-21 |
2012-02-28 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
|
KR20090018024A
(ko)
|
2006-05-18 |
2009-02-19 |
가부시키가이샤 니콘 |
노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법
|
|
CN102109773A
(zh)
|
2006-05-22 |
2011-06-29 |
株式会社尼康 |
曝光方法、曝光装置以及维修方法
|
|
SG172681A1
(en)
|
2006-06-09 |
2011-07-28 |
Nikon Corp |
Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method
|
|
JP4865414B2
(ja)
*
|
2006-06-22 |
2012-02-01 |
トッキ株式会社 |
アライメント方法
|
|
EP2990872B1
(en)
|
2006-08-31 |
2017-12-13 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
|
|
TWI602032B
(zh)
|
2006-08-31 |
2017-10-11 |
尼康股份有限公司 |
Exposure apparatus, exposure method, and device manufacturing method
|
|
SG174744A1
(en)
|
2006-08-31 |
2011-10-28 |
Nikon Corp |
Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
|
|
KR101770082B1
(ko)
|
2006-09-01 |
2017-08-21 |
가부시키가이샤 니콘 |
이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법
|
|
EP3361317A1
(en)
|
2006-09-01 |
2018-08-15 |
Nikon Corporation |
Exposure apparatus and exposure method
|
|
WO2008029917A1
(en)
|
2006-09-08 |
2008-03-13 |
Nikon Corporation |
Mask, exposure apparatus and device manufacturing method
|
|
JP5151989B2
(ja)
|
2006-11-09 |
2013-02-27 |
株式会社ニコン |
保持装置、位置検出装置及び露光装置、並びにデバイス製造方法
|
|
US8164736B2
(en)
|
2007-05-29 |
2012-04-24 |
Nikon Corporation |
Exposure method, exposure apparatus, and method for producing device
|
|
US8098362B2
(en)
|
2007-05-30 |
2012-01-17 |
Nikon Corporation |
Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
|
|
WO2009011119A1
(ja)
|
2007-07-13 |
2009-01-22 |
Nikon Corporation |
パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法及びデバイス
|
|
KR101843699B1
(ko)
|
2007-07-18 |
2018-03-29 |
가부시키가이샤 니콘 |
계측 방법, 스테이지 장치, 및 노광 장치
|
|
US8243257B2
(en)
|
2007-07-24 |
2012-08-14 |
Nikon Corporation |
Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
|
|
US8867022B2
(en)
|
2007-08-24 |
2014-10-21 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
|
|
US8237919B2
(en)
|
2007-08-24 |
2012-08-07 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
|
|
US8218129B2
(en)
|
2007-08-24 |
2012-07-10 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
|
|
US9304412B2
(en)
|
2007-08-24 |
2016-04-05 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
|
|
US8023106B2
(en)
|
2007-08-24 |
2011-09-20 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
|
|
JP5267029B2
(ja)
|
2007-10-12 |
2013-08-21 |
株式会社ニコン |
照明光学装置、露光装置及びデバイスの製造方法
|
|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
Nikon Corporation |
Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
|
|
US9116346B2
(en)
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
|
|
TW201443578A
(zh)
|
2007-12-28 |
2014-11-16 |
尼康股份有限公司 |
曝光裝置、移動體驅動系統、圖案形成裝置、及曝光方法、以及元件製造方法
|
|
JP2009206143A
(ja)
*
|
2008-02-26 |
2009-09-10 |
Seiko Instruments Inc |
アライメント方法
|
|
JP2011029458A
(ja)
*
|
2009-07-27 |
2011-02-10 |
Nikon Corp |
積層型半導体素子の製造方法、及び積層型半導体素子の製造装置
|
|
WO2012115002A1
(ja)
|
2011-02-22 |
2012-08-30 |
株式会社ニコン |
保持装置、露光装置、及びデバイスの製造方法
|
|
JP6159072B2
(ja)
|
2011-11-30 |
2017-07-05 |
キヤノン株式会社 |
インプリント装置、インプリント方法及び物品の製造方法
|
|
CN104364892B
(zh)
|
2012-06-06 |
2017-11-03 |
Ev 集团 E·索尔纳有限责任公司 |
用于确定对准误差的装置和方法
|
|
JP6643834B2
(ja)
*
|
2015-09-02 |
2020-02-12 |
キヤノン株式会社 |
ディストーション検出方法、露光装置、露光方法、およびデバイス製造方法
|
|
JP6337179B2
(ja)
*
|
2017-05-10 |
2018-06-06 |
エーファウ・グループ・エー・タルナー・ゲーエムベーハー |
位置合わせ誤差を求めるための装置と方法
|
|
JP7580297B2
(ja)
|
2021-02-22 |
2024-11-11 |
キヤノン株式会社 |
基板上の複数のショット領域の配列を求める方法、露光装置、物品の製造方法、プログラム及び情報処理装置
|
|
JP7745407B2
(ja)
|
2021-10-01 |
2025-09-29 |
キヤノン株式会社 |
基板上の複数のショット領域の配列を求める方法、露光方法、露光装置、物品の製造方法、プログラム及び情報処理装置
|