JPH0447968B2 - - Google Patents

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Publication number
JPH0447968B2
JPH0447968B2 JP59167020A JP16702084A JPH0447968B2 JP H0447968 B2 JPH0447968 B2 JP H0447968B2 JP 59167020 A JP59167020 A JP 59167020A JP 16702084 A JP16702084 A JP 16702084A JP H0447968 B2 JPH0447968 B2 JP H0447968B2
Authority
JP
Japan
Prior art keywords
stage
coordinate
center point
values
regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59167020A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6144429A (ja
Inventor
Toshikazu Umadate
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP59167020A priority Critical patent/JPS6144429A/ja
Publication of JPS6144429A publication Critical patent/JPS6144429A/ja
Priority to US06/915,027 priority patent/US4780617A/en
Publication of JPH0447968B2 publication Critical patent/JPH0447968B2/ja
Granted legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59167020A 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置 Granted JPS6144429A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59167020A JPS6144429A (ja) 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置
US06/915,027 US4780617A (en) 1984-08-09 1986-10-03 Method for successive alignment of chip patterns on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59167020A JPS6144429A (ja) 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP5201725A Division JPH0738376B2 (ja) 1993-08-13 1993-08-13 投影露光装置
JP6314725A Division JP2638528B2 (ja) 1994-12-19 1994-12-19 位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS6144429A JPS6144429A (ja) 1986-03-04
JPH0447968B2 true JPH0447968B2 (enExample) 1992-08-05

Family

ID=15841900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59167020A Granted JPS6144429A (ja) 1984-08-09 1984-08-09 位置合わせ方法、及び位置合せ装置

Country Status (1)

Country Link
JP (1) JPS6144429A (enExample)

Families Citing this family (100)

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JPS63299122A (ja) * 1987-05-29 1988-12-06 Canon Inc 露光装置の位置合せ方法
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JP6337179B2 (ja) * 2017-05-10 2018-06-06 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 位置合わせ誤差を求めるための装置と方法
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JP7745407B2 (ja) 2021-10-01 2025-09-29 キヤノン株式会社 基板上の複数のショット領域の配列を求める方法、露光方法、露光装置、物品の製造方法、プログラム及び情報処理装置

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JPS58103136A (ja) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> 基板の傾き設定装置
JPS5954225A (ja) * 1982-09-21 1984-03-29 Hitachi Ltd 投影露光方法

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