JPH0445976B2 - - Google Patents

Info

Publication number
JPH0445976B2
JPH0445976B2 JP56192593A JP19259381A JPH0445976B2 JP H0445976 B2 JPH0445976 B2 JP H0445976B2 JP 56192593 A JP56192593 A JP 56192593A JP 19259381 A JP19259381 A JP 19259381A JP H0445976 B2 JPH0445976 B2 JP H0445976B2
Authority
JP
Japan
Prior art keywords
layer
electron
semiconductor
manufacturing
electromagnetic waves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56192593A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5893377A (ja
Inventor
Kazuo Nanbu
Shigeru Tatsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56192593A priority Critical patent/JPS5893377A/ja
Publication of JPS5893377A publication Critical patent/JPS5893377A/ja
Publication of JPH0445976B2 publication Critical patent/JPH0445976B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/80FETs having rectifying junction gate electrodes

Landscapes

  • Non-Volatile Memory (AREA)
  • Junction Field-Effect Transistors (AREA)
JP56192593A 1981-11-30 1981-11-30 半導体装置の製造方法 Granted JPS5893377A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56192593A JPS5893377A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56192593A JPS5893377A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5893377A JPS5893377A (ja) 1983-06-03
JPH0445976B2 true JPH0445976B2 (enrdf_load_stackoverflow) 1992-07-28

Family

ID=16293849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56192593A Granted JPS5893377A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5893377A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6251268A (ja) * 1985-08-30 1987-03-05 Hitachi Ltd 半導体装置
JPH084139B2 (ja) * 1986-06-13 1996-01-17 日本電気株式会社 半導体装置
JP2651143B2 (ja) * 1987-01-19 1997-09-10 株式会社日立製作所 超伝導トランジスタ
WO2005024909A2 (en) 2003-09-09 2005-03-17 The Regents Of The University Of California Fabrication of single or multiple gate field plates
JP7640000B1 (ja) * 2024-03-28 2025-03-05 三菱電機株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS5893377A (ja) 1983-06-03

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