JPH0441484B2 - - Google Patents

Info

Publication number
JPH0441484B2
JPH0441484B2 JP58175353A JP17535383A JPH0441484B2 JP H0441484 B2 JPH0441484 B2 JP H0441484B2 JP 58175353 A JP58175353 A JP 58175353A JP 17535383 A JP17535383 A JP 17535383A JP H0441484 B2 JPH0441484 B2 JP H0441484B2
Authority
JP
Japan
Prior art keywords
grating
light
interference fringes
alignment
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58175353A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6066818A (ja
Inventor
Noboru Nomura
Koichi Kugimya
Ryukichi Matsumura
Taketoshi Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58175353A priority Critical patent/JPS6066818A/ja
Priority to US06/599,734 priority patent/US4636077A/en
Publication of JPS6066818A publication Critical patent/JPS6066818A/ja
Priority to US07/296,721 priority patent/USRE33669E/en
Publication of JPH0441484B2 publication Critical patent/JPH0441484B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58175353A 1983-04-15 1983-09-22 位置合わせ方法 Granted JPS6066818A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58175353A JPS6066818A (ja) 1983-09-22 1983-09-22 位置合わせ方法
US06/599,734 US4636077A (en) 1983-04-15 1984-04-12 Aligning exposure method
US07/296,721 USRE33669E (en) 1983-04-15 1989-01-12 Aligning exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58175353A JPS6066818A (ja) 1983-09-22 1983-09-22 位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS6066818A JPS6066818A (ja) 1985-04-17
JPH0441484B2 true JPH0441484B2 (zh) 1992-07-08

Family

ID=15994583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58175353A Granted JPS6066818A (ja) 1983-04-15 1983-09-22 位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS6066818A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5288115B2 (ja) 2008-12-10 2013-09-11 ニチアス株式会社 触媒コンバーター及び触媒コンバーター用保持材の製造方法
CN104570621B (zh) * 2015-01-14 2016-06-15 清华大学 一种双光束曝光系统中光栅衍射波面误差的反馈调节方法
CN108761603B (zh) * 2018-05-22 2020-06-16 苏州大学 一种制作平行等间距条纹全息光栅的光刻系统
CN108761602B (zh) * 2018-05-22 2020-06-16 苏州大学 一种全息光栅光刻系统中干涉光路自准直的调节方法

Also Published As

Publication number Publication date
JPS6066818A (ja) 1985-04-17

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