JPH0476489B2 - - Google Patents

Info

Publication number
JPH0476489B2
JPH0476489B2 JP60227103A JP22710385A JPH0476489B2 JP H0476489 B2 JPH0476489 B2 JP H0476489B2 JP 60227103 A JP60227103 A JP 60227103A JP 22710385 A JP22710385 A JP 22710385A JP H0476489 B2 JPH0476489 B2 JP H0476489B2
Authority
JP
Japan
Prior art keywords
light
grating
optical system
reticle
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60227103A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6286722A (ja
Inventor
Noboru Nomura
Kazuhiro Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60227103A priority Critical patent/JPS6286722A/ja
Priority to US06/916,738 priority patent/US4771180A/en
Publication of JPS6286722A publication Critical patent/JPS6286722A/ja
Publication of JPH0476489B2 publication Critical patent/JPH0476489B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60227103A 1985-10-11 1985-10-11 露光装置 Granted JPS6286722A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60227103A JPS6286722A (ja) 1985-10-11 1985-10-11 露光装置
US06/916,738 US4771180A (en) 1985-10-11 1986-10-08 Exposure apparatus including an optical system for aligning a reticle and a wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60227103A JPS6286722A (ja) 1985-10-11 1985-10-11 露光装置

Publications (2)

Publication Number Publication Date
JPS6286722A JPS6286722A (ja) 1987-04-21
JPH0476489B2 true JPH0476489B2 (zh) 1992-12-03

Family

ID=16855526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60227103A Granted JPS6286722A (ja) 1985-10-11 1985-10-11 露光装置

Country Status (1)

Country Link
JP (1) JPS6286722A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06105679B2 (ja) * 1987-09-29 1994-12-21 松下電器産業株式会社 露光装置
US5325176A (en) * 1988-02-16 1994-06-28 Canon Kabushiki Kaisha Position detecting method and apparatus including Fraunhofer diffraction detector
JPH0732116B2 (ja) * 1989-07-13 1995-04-10 松下電器産業株式会社 露光装置
US7433018B2 (en) * 2005-12-27 2008-10-07 Asml Netherlands B.V. Pattern alignment method and lithographic apparatus

Also Published As

Publication number Publication date
JPS6286722A (ja) 1987-04-21

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