JPH0436727B2 - - Google Patents
Info
- Publication number
- JPH0436727B2 JPH0436727B2 JP62126701A JP12670187A JPH0436727B2 JP H0436727 B2 JPH0436727 B2 JP H0436727B2 JP 62126701 A JP62126701 A JP 62126701A JP 12670187 A JP12670187 A JP 12670187A JP H0436727 B2 JPH0436727 B2 JP H0436727B2
- Authority
- JP
- Japan
- Prior art keywords
- dry etching
- pump
- exhaust gas
- vacuum pump
- adsorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001312 dry etching Methods 0.000 claims description 31
- 239000007789 gas Substances 0.000 claims description 30
- 150000002222 fluorine compounds Chemical class 0.000 claims description 17
- 150000001805 chlorine compounds Chemical class 0.000 claims description 16
- 229910052785 arsenic Inorganic materials 0.000 claims description 15
- 229910052733 gallium Inorganic materials 0.000 claims description 15
- 235000012431 wafers Nutrition 0.000 claims description 15
- 239000003463 adsorbent Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims description 8
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 description 9
- 238000009825 accumulation Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- GCPXMJHSNVMWNM-UHFFFAOYSA-N arsenous acid Chemical compound O[As](O)O GCPXMJHSNVMWNM-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Treating Waste Gases (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62126701A JPS63291624A (ja) | 1987-05-23 | 1987-05-23 | ガリウム・ヒ素ウェハ−のドライエッチング排ガスの処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62126701A JPS63291624A (ja) | 1987-05-23 | 1987-05-23 | ガリウム・ヒ素ウェハ−のドライエッチング排ガスの処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63291624A JPS63291624A (ja) | 1988-11-29 |
| JPH0436727B2 true JPH0436727B2 (ko) | 1992-06-17 |
Family
ID=14941707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62126701A Granted JPS63291624A (ja) | 1987-05-23 | 1987-05-23 | ガリウム・ヒ素ウェハ−のドライエッチング排ガスの処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63291624A (ko) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0715131Y2 (ja) * | 1989-01-20 | 1995-04-10 | 古河電気工業株式会社 | 有機金属気相成長装置 |
| JPH0647233A (ja) * | 1992-06-09 | 1994-02-22 | Ebara Infilco Co Ltd | ハロゲン系排ガスの処理方法 |
| JP4558176B2 (ja) * | 2000-11-17 | 2010-10-06 | 三菱電機株式会社 | ハロゲン含有ガス処理方法及び処理装置 |
| JP2006253517A (ja) * | 2005-03-14 | 2006-09-21 | Dainippon Screen Mfg Co Ltd | 減圧乾燥装置 |
| JP2013086088A (ja) * | 2011-10-24 | 2013-05-13 | Taiyo Nippon Sanso Corp | ハロゲン化物粒子を含むガスの除害方法 |
| KR101514801B1 (ko) * | 2013-06-25 | 2015-04-24 | (주)파인텍 | 과불화화합물의 분리 및 재활용시스템 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59109227A (ja) * | 1982-12-14 | 1984-06-23 | Showa Denko Kk | ドライエツチング排ガスの処理方法 |
| JPS60198394A (ja) * | 1984-03-21 | 1985-10-07 | Anelva Corp | 真空処理装置の排気装置 |
| JPS6161016B2 (ko) * | 1981-04-17 | 1986-12-23 | Sanyo Electric Co | |
| JPH0339198A (ja) * | 1989-07-05 | 1991-02-20 | Matsushita Electric Ind Co Ltd | 誘導加熱式アイロン |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6161016U (ko) * | 1984-09-27 | 1986-04-24 |
-
1987
- 1987-05-23 JP JP62126701A patent/JPS63291624A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6161016B2 (ko) * | 1981-04-17 | 1986-12-23 | Sanyo Electric Co | |
| JPS59109227A (ja) * | 1982-12-14 | 1984-06-23 | Showa Denko Kk | ドライエツチング排ガスの処理方法 |
| JPS60198394A (ja) * | 1984-03-21 | 1985-10-07 | Anelva Corp | 真空処理装置の排気装置 |
| JPH0339198A (ja) * | 1989-07-05 | 1991-02-20 | Matsushita Electric Ind Co Ltd | 誘導加熱式アイロン |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63291624A (ja) | 1988-11-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |