JPH0430190B2 - - Google Patents
Info
- Publication number
- JPH0430190B2 JPH0430190B2 JP58097826A JP9782683A JPH0430190B2 JP H0430190 B2 JPH0430190 B2 JP H0430190B2 JP 58097826 A JP58097826 A JP 58097826A JP 9782683 A JP9782683 A JP 9782683A JP H0430190 B2 JPH0430190 B2 JP H0430190B2
- Authority
- JP
- Japan
- Prior art keywords
- circuit
- guard ring
- parasitic
- mos
- input
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/811—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58097826A JPS59224164A (ja) | 1983-06-03 | 1983-06-03 | 半導体集積回路装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58097826A JPS59224164A (ja) | 1983-06-03 | 1983-06-03 | 半導体集積回路装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59224164A JPS59224164A (ja) | 1984-12-17 |
| JPH0430190B2 true JPH0430190B2 (enExample) | 1992-05-21 |
Family
ID=14202527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58097826A Granted JPS59224164A (ja) | 1983-06-03 | 1983-06-03 | 半導体集積回路装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59224164A (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60117651A (ja) * | 1983-11-29 | 1985-06-25 | Fujitsu Ltd | 高耐圧保護回路装置 |
| JPS61292965A (ja) * | 1985-06-21 | 1986-12-23 | Hitachi Ltd | 半導体集積回路装置 |
| JP2500802B2 (ja) * | 1985-08-09 | 1996-05-29 | 株式会社 日立製作所 | 半導体装置 |
| JPH0750782B2 (ja) * | 1986-02-10 | 1995-05-31 | 三洋電機株式会社 | 入力保護回路 |
| JPH065749B2 (ja) * | 1986-05-22 | 1994-01-19 | 日本電気株式会社 | 半導体装置 |
| GB8621839D0 (en) * | 1986-09-10 | 1986-10-15 | British Aerospace | Electrostatic discharge protection circuit |
| JPS63165857U (enExample) * | 1987-04-17 | 1988-10-28 | ||
| US5196913A (en) * | 1988-07-11 | 1993-03-23 | Samsung Electronics Co., Ltd. | Input protection device for improving of delay time on input stage in semi-conductor devices |
| US5436183A (en) * | 1990-04-17 | 1995-07-25 | National Semiconductor Corporation | Electrostatic discharge protection transistor element fabrication process |
| DE59308352D1 (de) * | 1993-05-04 | 1998-05-07 | Siemens Ag | Integrierte Halbleiterschaltung mit einem Schutzmittel |
| US5637900A (en) * | 1995-04-06 | 1997-06-10 | Industrial Technology Research Institute | Latchup-free fully-protected CMOS on-chip ESD protection circuit |
| KR100425829B1 (ko) * | 1999-12-28 | 2004-04-03 | 주식회사 하이닉스반도체 | 정전기방전 보호소자 |
-
1983
- 1983-06-03 JP JP58097826A patent/JPS59224164A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59224164A (ja) | 1984-12-17 |
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