JPH0429052B2 - - Google Patents

Info

Publication number
JPH0429052B2
JPH0429052B2 JP1117302A JP11730289A JPH0429052B2 JP H0429052 B2 JPH0429052 B2 JP H0429052B2 JP 1117302 A JP1117302 A JP 1117302A JP 11730289 A JP11730289 A JP 11730289A JP H0429052 B2 JPH0429052 B2 JP H0429052B2
Authority
JP
Japan
Prior art keywords
ion beam
sample
electrode
less
spot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1117302A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0260A (ja
Inventor
Hiroshi Yamaguchi
Takeoki Myauchi
Akira Shimase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1117302A priority Critical patent/JPH0260A/ja
Publication of JPH0260A publication Critical patent/JPH0260A/ja
Publication of JPH0429052B2 publication Critical patent/JPH0429052B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1117302A 1989-05-12 1989-05-12 イオンビーム加工装置 Granted JPH0260A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1117302A JPH0260A (ja) 1989-05-12 1989-05-12 イオンビーム加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1117302A JPH0260A (ja) 1989-05-12 1989-05-12 イオンビーム加工装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57078165A Division JPS58196020A (ja) 1982-05-12 1982-05-12 マスクの欠陥検査・修正方法およびその装置

Publications (2)

Publication Number Publication Date
JPH0260A JPH0260A (ja) 1990-01-05
JPH0429052B2 true JPH0429052B2 (enrdf_load_stackoverflow) 1992-05-15

Family

ID=14708391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1117302A Granted JPH0260A (ja) 1989-05-12 1989-05-12 イオンビーム加工装置

Country Status (1)

Country Link
JP (1) JPH0260A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0780731B1 (en) 1995-12-22 2002-04-17 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid crystal display device
JP4200626B2 (ja) 2000-02-28 2008-12-24 株式会社デンソー 絶縁ゲート型パワー素子の製造方法
JP6292569B2 (ja) 2013-12-04 2018-03-14 協同油脂株式会社 等速ジョイント用グリース組成物及びそのグリース組成物を封入した等速ジョイント

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5568632A (en) * 1978-11-20 1980-05-23 Hitachi Ltd Manufacture of photomask
JPS55150225A (en) * 1979-05-11 1980-11-22 Hitachi Ltd Method of correcting white spot fault of photomask

Also Published As

Publication number Publication date
JPH0260A (ja) 1990-01-05

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