JPH0260A - イオンビーム加工装置 - Google Patents
イオンビーム加工装置Info
- Publication number
- JPH0260A JPH0260A JP1117302A JP11730289A JPH0260A JP H0260 A JPH0260 A JP H0260A JP 1117302 A JP1117302 A JP 1117302A JP 11730289 A JP11730289 A JP 11730289A JP H0260 A JPH0260 A JP H0260A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- sample
- electrode
- intensity
- focused
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1117302A JPH0260A (ja) | 1989-05-12 | 1989-05-12 | イオンビーム加工装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1117302A JPH0260A (ja) | 1989-05-12 | 1989-05-12 | イオンビーム加工装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57078165A Division JPS58196020A (ja) | 1982-05-12 | 1982-05-12 | マスクの欠陥検査・修正方法およびその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0260A true JPH0260A (ja) | 1990-01-05 |
JPH0429052B2 JPH0429052B2 (enrdf_load_stackoverflow) | 1992-05-15 |
Family
ID=14708391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1117302A Granted JPH0260A (ja) | 1989-05-12 | 1989-05-12 | イオンビーム加工装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0260A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0780731A2 (en) | 1995-12-22 | 1997-06-25 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a color filter, color filter and liquid crystal display device |
US6521538B2 (en) | 2000-02-28 | 2003-02-18 | Denso Corporation | Method of forming a trench with a rounded bottom in a semiconductor device |
WO2015083804A1 (ja) | 2013-12-04 | 2015-06-11 | 協同油脂株式会社 | 等速ジョイント用グリース組成物及びそのグリース組成物を封入した等速ジョイント |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5568632A (en) * | 1978-11-20 | 1980-05-23 | Hitachi Ltd | Manufacture of photomask |
JPS55150225A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting white spot fault of photomask |
-
1989
- 1989-05-12 JP JP1117302A patent/JPH0260A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5568632A (en) * | 1978-11-20 | 1980-05-23 | Hitachi Ltd | Manufacture of photomask |
JPS55150225A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting white spot fault of photomask |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0780731A2 (en) | 1995-12-22 | 1997-06-25 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a color filter, color filter and liquid crystal display device |
US6521538B2 (en) | 2000-02-28 | 2003-02-18 | Denso Corporation | Method of forming a trench with a rounded bottom in a semiconductor device |
WO2015083804A1 (ja) | 2013-12-04 | 2015-06-11 | 協同油脂株式会社 | 等速ジョイント用グリース組成物及びそのグリース組成物を封入した等速ジョイント |
Also Published As
Publication number | Publication date |
---|---|
JPH0429052B2 (enrdf_load_stackoverflow) | 1992-05-15 |
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