JPH0428097B2 - - Google Patents

Info

Publication number
JPH0428097B2
JPH0428097B2 JP57078165A JP7816582A JPH0428097B2 JP H0428097 B2 JPH0428097 B2 JP H0428097B2 JP 57078165 A JP57078165 A JP 57078165A JP 7816582 A JP7816582 A JP 7816582A JP H0428097 B2 JPH0428097 B2 JP H0428097B2
Authority
JP
Japan
Prior art keywords
mask
charged particle
secondary charged
ion source
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57078165A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58196020A (ja
Inventor
Hiroshi Yamaguchi
Takeoki Myauchi
Akira Shimase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57078165A priority Critical patent/JPS58196020A/ja
Publication of JPS58196020A publication Critical patent/JPS58196020A/ja
Publication of JPH0428097B2 publication Critical patent/JPH0428097B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57078165A 1982-05-12 1982-05-12 マスクの欠陥検査・修正方法およびその装置 Granted JPS58196020A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57078165A JPS58196020A (ja) 1982-05-12 1982-05-12 マスクの欠陥検査・修正方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57078165A JPS58196020A (ja) 1982-05-12 1982-05-12 マスクの欠陥検査・修正方法およびその装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP1117302A Division JPH0260A (ja) 1989-05-12 1989-05-12 イオンビーム加工装置
JP5237886A Division JP2590703B2 (ja) 1993-09-24 1993-09-24 イオンビーム加工装置

Publications (2)

Publication Number Publication Date
JPS58196020A JPS58196020A (ja) 1983-11-15
JPH0428097B2 true JPH0428097B2 (enrdf_load_stackoverflow) 1992-05-13

Family

ID=13654313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57078165A Granted JPS58196020A (ja) 1982-05-12 1982-05-12 マスクの欠陥検査・修正方法およびその装置

Country Status (1)

Country Link
JP (1) JPS58196020A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548883A (en) * 1983-05-31 1985-10-22 At&T Bell Laboratories Correction of lithographic masks
JPH0616391B2 (ja) * 1984-07-13 1994-03-02 株式会社日立製作所 イオンビーム照射装置
JPS6312347Y2 (enrdf_load_stackoverflow) * 1984-10-03 1988-04-08
JPS6312348Y2 (enrdf_load_stackoverflow) * 1984-10-03 1988-04-08
JPS6188261A (ja) * 1984-10-08 1986-05-06 Seiko Instr & Electronics Ltd イオンビ−ムによるマスクリペア−装置
JPS6272123A (ja) * 1985-09-25 1987-04-02 Mitsubishi Electric Corp パタ−ン欠陥検査修正方法
JPH0652423B2 (ja) * 1988-12-12 1994-07-06 三菱電機株式会社 パターン欠陥修正装置
JP2523385B2 (ja) * 1990-02-07 1996-08-07 セイコー電子工業株式会社 集束イオンビ―ム装置によるパタ―ン修正方法
JPH0771755B2 (ja) * 1992-09-11 1995-08-02 株式会社日立製作所 イオンビーム加工装置
JPH0771754B2 (ja) * 1992-09-11 1995-08-02 株式会社日立製作所 イオンビーム加工方法
JP2590703B2 (ja) * 1993-09-24 1997-03-12 株式会社日立製作所 イオンビーム加工装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5568632A (en) * 1978-11-20 1980-05-23 Hitachi Ltd Manufacture of photomask
JPS55150225A (en) * 1979-05-11 1980-11-22 Hitachi Ltd Method of correcting white spot fault of photomask

Also Published As

Publication number Publication date
JPS58196020A (ja) 1983-11-15

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