JPH0428294B2 - - Google Patents

Info

Publication number
JPH0428294B2
JPH0428294B2 JP58113459A JP11345983A JPH0428294B2 JP H0428294 B2 JPH0428294 B2 JP H0428294B2 JP 58113459 A JP58113459 A JP 58113459A JP 11345983 A JP11345983 A JP 11345983A JP H0428294 B2 JPH0428294 B2 JP H0428294B2
Authority
JP
Japan
Prior art keywords
exposed
esterification rate
naphthoquinone
printing plate
silicone rubber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58113459A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6029750A (ja
Inventor
Masaaki Yamada
Kunyuki Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP11345983A priority Critical patent/JPS6029750A/ja
Publication of JPS6029750A publication Critical patent/JPS6029750A/ja
Publication of JPH0428294B2 publication Critical patent/JPH0428294B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP11345983A 1983-06-23 1983-06-23 湿し水不要平版印刷版 Granted JPS6029750A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11345983A JPS6029750A (ja) 1983-06-23 1983-06-23 湿し水不要平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11345983A JPS6029750A (ja) 1983-06-23 1983-06-23 湿し水不要平版印刷版

Publications (2)

Publication Number Publication Date
JPS6029750A JPS6029750A (ja) 1985-02-15
JPH0428294B2 true JPH0428294B2 (enrdf_load_stackoverflow) 1992-05-14

Family

ID=14612772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11345983A Granted JPS6029750A (ja) 1983-06-23 1983-06-23 湿し水不要平版印刷版

Country Status (1)

Country Link
JP (1) JPS6029750A (enrdf_load_stackoverflow)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5559466A (en) * 1978-10-26 1980-05-02 Toray Ind Inc Lithographic printing plate without requiring dampening water
JPS5680046A (en) * 1979-12-05 1981-07-01 Toray Ind Inc Lithographic plate requiring no dampening water and its manufacture
JPS58152236A (ja) * 1982-03-05 1983-09-09 Toray Ind Inc 感光性組成物

Also Published As

Publication number Publication date
JPS6029750A (ja) 1985-02-15

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