JPH0145625B2 - - Google Patents

Info

Publication number
JPH0145625B2
JPH0145625B2 JP7797581A JP7797581A JPH0145625B2 JP H0145625 B2 JPH0145625 B2 JP H0145625B2 JP 7797581 A JP7797581 A JP 7797581A JP 7797581 A JP7797581 A JP 7797581A JP H0145625 B2 JPH0145625 B2 JP H0145625B2
Authority
JP
Japan
Prior art keywords
silicone rubber
photosensitive layer
layer
rubber layer
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7797581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57192957A (en
Inventor
Takashi Fujita
Mikio Tsuda
Sadao Kobashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP7797581A priority Critical patent/JPS57192957A/ja
Publication of JPS57192957A publication Critical patent/JPS57192957A/ja
Publication of JPH0145625B2 publication Critical patent/JPH0145625B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7797581A 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board Granted JPS57192957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7797581A JPS57192957A (en) 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7797581A JPS57192957A (en) 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board

Publications (2)

Publication Number Publication Date
JPS57192957A JPS57192957A (en) 1982-11-27
JPH0145625B2 true JPH0145625B2 (enrdf_load_stackoverflow) 1989-10-04

Family

ID=13648891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7797581A Granted JPS57192957A (en) 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board

Country Status (1)

Country Link
JP (1) JPS57192957A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS57192957A (en) 1982-11-27

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