JPS57192957A - Fixing method for moistening-unrequired negative type lithography printing board - Google Patents

Fixing method for moistening-unrequired negative type lithography printing board

Info

Publication number
JPS57192957A
JPS57192957A JP7797581A JP7797581A JPS57192957A JP S57192957 A JPS57192957 A JP S57192957A JP 7797581 A JP7797581 A JP 7797581A JP 7797581 A JP7797581 A JP 7797581A JP S57192957 A JPS57192957 A JP S57192957A
Authority
JP
Japan
Prior art keywords
silicone rubber
layer
rubber layer
photosensitive
unrequired
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7797581A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0145625B2 (enrdf_load_stackoverflow
Inventor
Takashi Fujita
Mikio Tsuda
Sadao Kobashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP7797581A priority Critical patent/JPS57192957A/ja
Publication of JPS57192957A publication Critical patent/JPS57192957A/ja
Publication of JPH0145625B2 publication Critical patent/JPH0145625B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7797581A 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board Granted JPS57192957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7797581A JPS57192957A (en) 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7797581A JPS57192957A (en) 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board

Publications (2)

Publication Number Publication Date
JPS57192957A true JPS57192957A (en) 1982-11-27
JPH0145625B2 JPH0145625B2 (enrdf_load_stackoverflow) 1989-10-04

Family

ID=13648891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7797581A Granted JPS57192957A (en) 1981-05-25 1981-05-25 Fixing method for moistening-unrequired negative type lithography printing board

Country Status (1)

Country Link
JP (1) JPS57192957A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0145625B2 (enrdf_load_stackoverflow) 1989-10-04

Similar Documents

Publication Publication Date Title
KR840006419A (ko) 감광성 전사물질 및 감광성 내식막의 제조방법
ATE544095T1 (de) Verfahren zur herstellung einer druckplatte
ES2066612T3 (es) Procedimiento de impresion de laminas, asi como transferidora de laminas.
JPS5740248A (en) Photographic copying material and method of coating photosensitive copying layer on support
GB2285413A (en) Embossed-pattern transfer sheet and method of pattern transfer
ATE187261T1 (de) Verfahren zur erstellung eines bildes von einer maskenstruktur
JPS5479032A (en) Image formation emthod
ATE68892T1 (de) Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers.
JPS5625739A (en) Preparation of printing plate
ATE24244T1 (de) Photoempfindliches material fuer trockentransfer.
FI823414A7 (fi) Valotettujen negatiivi-työskentelevien jäljennöskerrosten kehitin ja menetelmä tällaisten kerrosten kehittämikehittämiseksi.
EP0123153A3 (en) Plate making process using positive working presensitized plate
ATE94662T1 (de) Verfahren zur herstellung von flachdruckplatten.
KR970011911A (ko) 차광층, 차광층의 형성방법 및 기판의 제조방법
IT8148391A0 (it) Soluzione di sviluppo per pellicole fotosensibili contenenti uno strato di photoresist su un substrato rivestito con alluminio e procedimento di impiego
JPS57192957A (en) Fixing method for moistening-unrequired negative type lithography printing board
US3238043A (en) Viscous processing solution
EP0346921A3 (en) Photo-sensitive printing plate processing apparatus
JPS56167135A (en) Contact exposing method
DE69412239D1 (de) Laminierter schichtträger für photographischen film
GB2020836A (en) Dry Processable Lithographic Printing Plate
DE3381059D1 (de) Verfahren und vorrichtung fuer automatische repetier-positionierung und bildmaessige belichtung von filmsubstraten.
JPS5588069A (en) Tacky transfer paper for liquid development
JPS57192956A (en) Fixing method for negative type lithographic plate requiring no dampening water
JPS5560947A (en) Fixing method of negative type lithographic printing plate which does not requier dampening water