ATE187261T1 - Verfahren zur erstellung eines bildes von einer maskenstruktur - Google Patents

Verfahren zur erstellung eines bildes von einer maskenstruktur

Info

Publication number
ATE187261T1
ATE187261T1 AT93912488T AT93912488T ATE187261T1 AT E187261 T1 ATE187261 T1 AT E187261T1 AT 93912488 T AT93912488 T AT 93912488T AT 93912488 T AT93912488 T AT 93912488T AT E187261 T1 ATE187261 T1 AT E187261T1
Authority
AT
Austria
Prior art keywords
pct
mask
alignment
alignment device
feature
Prior art date
Application number
AT93912488T
Other languages
English (en)
Inventor
Rainer Pforr
Steve Wittekoek
Rolf Seltmann
Original Assignee
Imec Inter Uni Micro Electr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imec Inter Uni Micro Electr filed Critical Imec Inter Uni Micro Electr
Application granted granted Critical
Publication of ATE187261T1 publication Critical patent/ATE187261T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70653—Metrology techniques
    • G03F7/70675—Latent image, i.e. measuring the image of the exposed resist prior to development

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
AT93912488T 1992-07-01 1993-07-01 Verfahren zur erstellung eines bildes von einer maskenstruktur ATE187261T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9200611A BE1006067A3 (nl) 1992-07-01 1992-07-01 Optisch systeem voor het afbeelden van een maskerpatroon in een fotogevoelige laag.

Publications (1)

Publication Number Publication Date
ATE187261T1 true ATE187261T1 (de) 1999-12-15

Family

ID=3886345

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93912488T ATE187261T1 (de) 1992-07-01 1993-07-01 Verfahren zur erstellung eines bildes von einer maskenstruktur

Country Status (7)

Country Link
US (1) US5496669A (de)
EP (1) EP0602200B1 (de)
JP (2) JP3399949B2 (de)
AT (1) ATE187261T1 (de)
BE (1) BE1006067A3 (de)
DE (1) DE69327149T2 (de)
WO (1) WO1994001808A1 (de)

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WO2001013174A1 (en) 1999-08-17 2001-02-22 Applied Science Fiction, Inc. Method and system for using calibration patches in electronic film processing
WO2001045042A1 (en) * 1999-12-17 2001-06-21 Applied Science Fiction, Inc. Method and system for selective enhancement of image data
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
US6864973B2 (en) * 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
US6505977B2 (en) 1999-12-30 2003-01-14 Applied Science Fiction, Inc. System and method for digital color dye film processing
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
US6540416B2 (en) 1999-12-30 2003-04-01 Applied Science Fiction, Inc. System and method for digital film development using visible light
AU2742701A (en) 1999-12-30 2001-07-16 Applied Science Fiction, Inc. Improved system and method for digital film development using visible light
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US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
JP2004514156A (ja) 2000-02-03 2004-05-13 アプライド・サイエンス・フィクション フィルム処理液カートリッジ、および、フィルムを現像しかつディジタル化するための方法
WO2001095028A2 (en) 2000-02-03 2001-12-13 Applied Science Fiction Method and system for self-service film processing
US20010040701A1 (en) * 2000-02-03 2001-11-15 Edgar Albert D. Photographic film having time resolved sensitivity distinction
US6990251B2 (en) 2000-02-03 2006-01-24 Eastman Kodak Company Method, system, and software for signal processing using sheep and shepherd artifacts
WO2001057796A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Method, system, and software for signal processing using pyramidal decomposition
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US6805501B2 (en) * 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
JP5002100B2 (ja) * 2001-09-13 2012-08-15 キヤノン株式会社 焦点位置検出方法及び焦点位置検出装置
US6809824B1 (en) * 2001-11-30 2004-10-26 Lsi Logic Corporation Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
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KR20060119707A (ko) * 2004-02-13 2006-11-24 소니 가부시끼 가이샤 화상 처리 장치와 화상 처리 방법 및 프로그램
KR100601957B1 (ko) * 2004-07-07 2006-07-14 삼성전자주식회사 얼굴 인식을 위한 영상간 대응 결정 방법 및 장치, 이를이루기위한 영상 보정 방법 및 장치
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Also Published As

Publication number Publication date
DE69327149D1 (de) 2000-01-05
JP3399949B2 (ja) 2003-04-28
EP0602200A1 (de) 1994-06-22
WO1994001808A1 (en) 1994-01-20
BE1006067A3 (nl) 1994-05-03
JP3843308B2 (ja) 2006-11-08
EP0602200B1 (de) 1999-12-01
JPH07502380A (ja) 1995-03-09
JP2003133229A (ja) 2003-05-09
DE69327149T2 (de) 2000-07-20
US5496669A (en) 1996-03-05

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