DE69327149T2 - Verfahren zur erstellung eines bildes von einer maskenstruktur - Google Patents

Verfahren zur erstellung eines bildes von einer maskenstruktur

Info

Publication number
DE69327149T2
DE69327149T2 DE69327149T DE69327149T DE69327149T2 DE 69327149 T2 DE69327149 T2 DE 69327149T2 DE 69327149 T DE69327149 T DE 69327149T DE 69327149 T DE69327149 T DE 69327149T DE 69327149 T2 DE69327149 T2 DE 69327149T2
Authority
DE
Germany
Prior art keywords
pct
mask
alignment
alignment device
feature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69327149T
Other languages
English (en)
Other versions
DE69327149D1 (de
Inventor
Rainer Pforr
Steve Wittekoek
Rolf Seltmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
Interuniversitair Microelektronica Centrum vzw IMEC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Interuniversitair Microelektronica Centrum vzw IMEC filed Critical Interuniversitair Microelektronica Centrum vzw IMEC
Publication of DE69327149D1 publication Critical patent/DE69327149D1/de
Application granted granted Critical
Publication of DE69327149T2 publication Critical patent/DE69327149T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70653—Metrology techniques
    • G03F7/70675—Latent image, i.e. measuring the image of the exposed resist prior to development

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE69327149T 1992-07-01 1993-07-01 Verfahren zur erstellung eines bildes von einer maskenstruktur Expired - Fee Related DE69327149T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE9200611A BE1006067A3 (nl) 1992-07-01 1992-07-01 Optisch systeem voor het afbeelden van een maskerpatroon in een fotogevoelige laag.
PCT/BE1993/000046 WO1994001808A1 (en) 1992-07-01 1993-07-01 System for detecting a latent image using an alignment apparatus

Publications (2)

Publication Number Publication Date
DE69327149D1 DE69327149D1 (de) 2000-01-05
DE69327149T2 true DE69327149T2 (de) 2000-07-20

Family

ID=3886345

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69327149T Expired - Fee Related DE69327149T2 (de) 1992-07-01 1993-07-01 Verfahren zur erstellung eines bildes von einer maskenstruktur

Country Status (7)

Country Link
US (1) US5496669A (de)
EP (1) EP0602200B1 (de)
JP (2) JP3399949B2 (de)
AT (1) ATE187261T1 (de)
BE (1) BE1006067A3 (de)
DE (1) DE69327149T2 (de)
WO (1) WO1994001808A1 (de)

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US6159660A (en) * 1997-02-03 2000-12-12 Taiwan Semiconductor Manufacturing Company Ltd. Opposite focus control to avoid keyholes inside a passivation layer
US5949547A (en) * 1997-02-20 1999-09-07 Taiwan Semiconductor Manufacturing Company, Ltd. System for in-line monitoring of photo processing in VLSI fabrication
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US6042975A (en) * 1998-07-08 2000-03-28 Lucent Technologies Inc. Alignment techniques for photolithography utilizing multiple photoresist layers
US6594041B1 (en) 1998-11-20 2003-07-15 Applied Science Fiction, Inc. Log time processing and stitching system
US6404516B1 (en) 1999-02-22 2002-06-11 Applied Science Fiction, Inc. Parametric image stitching
US6781620B1 (en) 1999-03-16 2004-08-24 Eastman Kodak Company Mixed-element stitching and noise reduction system
TW495389B (en) 1999-06-29 2002-07-21 Applied Science Fiction Inc Slot coater device for applying developer to film for electronic film development
DE60014956T2 (de) 1999-08-17 2006-02-09 Eastman Kodak Co. Verfahren und System für die Verwendung von Eichzonen in der Elektronischen Filmentwicklung
US6915021B2 (en) * 1999-12-17 2005-07-05 Eastman Kodak Company Method and system for selective enhancement of image data
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
US6505977B2 (en) 1999-12-30 2003-01-14 Applied Science Fiction, Inc. System and method for digital color dye film processing
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
WO2001052556A2 (en) * 1999-12-30 2001-07-19 Applied Science Fiction, Inc. Methods and apparatus for transporting and positioning film in a digital film processing system
WO2001050194A1 (en) * 1999-12-30 2001-07-12 Applied Science Fiction, Inc. System and method for digital film development using visible light
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
US6864973B2 (en) 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
JP2003519410A (ja) 1999-12-30 2003-06-17 アプライド、サイエンス、フィクシャン、インク 可視光を使用してデジタルフィルムを現像するための改良されたシステムおよび方法
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
US20010030685A1 (en) * 1999-12-30 2001-10-18 Darbin Stephen P. Method and apparatus for digital film processing using a scanning station having a single sensor
US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
WO2001050192A1 (en) * 1999-12-31 2001-07-12 Applied Science Fiction, Inc. Digital film processing method
WO2001057798A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Match blur system and method
US6619863B2 (en) 2000-02-03 2003-09-16 Eastman Kodak Company Method and system for capturing film images
US6786655B2 (en) 2000-02-03 2004-09-07 Eastman Kodak Company Method and system for self-service film processing
AU2001239745A1 (en) 2000-02-03 2001-08-14 Applied Science Fiction Method, system, and software for signal processing using pyramidal decomposition
WO2001057797A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Method, system and software for signal processing using sheep and shepherd artifacts
WO2001057594A2 (en) 2000-02-03 2001-08-09 Applied Science Fiction Film processing solution cartridge and method for developing and digitizing film
US20010040701A1 (en) * 2000-02-03 2001-11-15 Edgar Albert D. Photographic film having time resolved sensitivity distinction
US6482572B1 (en) 2000-02-25 2002-11-19 Micron Technology, Inc. Method for providing an alignment diffraction grating for photolithographic alignment during semiconductor fabrication
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US20020118402A1 (en) * 2000-09-19 2002-08-29 Shaw Timothy C. Film bridge for digital film scanning system
US20020176113A1 (en) * 2000-09-21 2002-11-28 Edgar Albert D. Dynamic image correction and imaging systems
US20020146171A1 (en) * 2000-10-01 2002-10-10 Applied Science Fiction, Inc. Method, apparatus and system for black segment detection
US6888997B2 (en) * 2000-12-05 2005-05-03 Eastman Kodak Company Waveguide device and optical transfer system for directing light to an image plane
CN1520532A (zh) 2001-02-09 2004-08-11 伊斯曼柯达公司 数字洗片溶液和数字洗片方法
US6561706B2 (en) 2001-06-28 2003-05-13 Advanced Micro Devices, Inc. Critical dimension monitoring from latent image
KR100391983B1 (ko) * 2001-07-03 2003-07-22 삼성전자주식회사 반도체 노광 장비의 정렬 시스템
US6805501B2 (en) * 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
JP5002100B2 (ja) * 2001-09-13 2012-08-15 キヤノン株式会社 焦点位置検出方法及び焦点位置検出装置
US6809824B1 (en) * 2001-11-30 2004-10-26 Lsi Logic Corporation Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
CN100337089C (zh) * 2002-09-20 2007-09-12 Asml荷兰有限公司 器件检验
WO2005079061A1 (ja) * 2004-02-13 2005-08-25 Sony Corporation 画像処理装置と画像処理方法およびプログラム
KR100601957B1 (ko) * 2004-07-07 2006-07-14 삼성전자주식회사 얼굴 인식을 위한 영상간 대응 결정 방법 및 장치, 이를이루기위한 영상 보정 방법 및 장치
US20060109463A1 (en) * 2004-11-22 2006-05-25 Asml Netherlands B.V. Latent overlay metrology
US8670106B2 (en) * 2008-09-23 2014-03-11 Pinebrook Imaging, Inc. Optical imaging writer system
CN102692820B (zh) 2011-03-21 2014-12-17 上海微电子装备有限公司 一种测量投影物镜畸变的装置及方法
JP5943717B2 (ja) * 2012-06-05 2016-07-05 キヤノン株式会社 位置検出システム、インプリント装置、デバイス製造方法、および位置検出方法

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US4786166A (en) * 1987-06-01 1988-11-22 Hewlett-Packard Company Determination of focal plane for a scanning projection aligner
US5124927A (en) * 1990-03-02 1992-06-23 International Business Machines Corp. Latent-image control of lithography tools

Also Published As

Publication number Publication date
JPH07502380A (ja) 1995-03-09
DE69327149D1 (de) 2000-01-05
EP0602200B1 (de) 1999-12-01
EP0602200A1 (de) 1994-06-22
JP3843308B2 (ja) 2006-11-08
JP2003133229A (ja) 2003-05-09
US5496669A (en) 1996-03-05
BE1006067A3 (nl) 1994-05-03
ATE187261T1 (de) 1999-12-15
WO1994001808A1 (en) 1994-01-20
JP3399949B2 (ja) 2003-04-28

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: ASML NETHERLANDS B.V., VELDHOVEN, NL

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee