JPH0428099B2 - - Google Patents

Info

Publication number
JPH0428099B2
JPH0428099B2 JP56113310A JP11331081A JPH0428099B2 JP H0428099 B2 JPH0428099 B2 JP H0428099B2 JP 56113310 A JP56113310 A JP 56113310A JP 11331081 A JP11331081 A JP 11331081A JP H0428099 B2 JPH0428099 B2 JP H0428099B2
Authority
JP
Japan
Prior art keywords
exposed
film
point
holes
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56113310A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5814839A (ja
Inventor
Hide Myazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP56113310A priority Critical patent/JPS5814839A/ja
Publication of JPS5814839A publication Critical patent/JPS5814839A/ja
Publication of JPH0428099B2 publication Critical patent/JPH0428099B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
JP56113310A 1981-07-20 1981-07-20 投影露光装置 Granted JPS5814839A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56113310A JPS5814839A (ja) 1981-07-20 1981-07-20 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56113310A JPS5814839A (ja) 1981-07-20 1981-07-20 投影露光装置

Publications (2)

Publication Number Publication Date
JPS5814839A JPS5814839A (ja) 1983-01-27
JPH0428099B2 true JPH0428099B2 (enrdf_load_stackoverflow) 1992-05-13

Family

ID=14608989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56113310A Granted JPS5814839A (ja) 1981-07-20 1981-07-20 投影露光装置

Country Status (1)

Country Link
JP (1) JPS5814839A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631133A (en) * 1984-09-13 1986-12-23 Axelrod R & D, Inc. Waste treatment device and method using microwaves
JPS6490099A (en) * 1987-10-01 1989-04-05 Kaneyuki Suzuki Night soil treating device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5114931Y2 (enrdf_load_stackoverflow) * 1971-03-18 1976-04-20
JPS563702Y2 (enrdf_load_stackoverflow) * 1974-03-30 1981-01-27
JPS513621A (en) * 1974-06-28 1976-01-13 Shigeru Usami Reriifusakuseihoho
JPS5636179U (enrdf_load_stackoverflow) * 1979-08-28 1981-04-07
JPS5667984A (en) * 1979-11-09 1981-06-08 Fujitsu Ltd Method of printing printed board

Also Published As

Publication number Publication date
JPS5814839A (ja) 1983-01-27

Similar Documents

Publication Publication Date Title
JP3336955B2 (ja) 裏面アライメント機能を備えた露光装置
CN1873541B (zh) 具有良好平坦度的基板卡盘的曝光装置
JP2009031561A (ja) 投影露光装置及び分割露光方法
CN111487849A (zh) 曝光机的对位系统及其对位方法
KR910008768A (ko) 노광방법 및 노광장치
JP2000155430A (ja) 両面露光装置における自動アライメント方法
JPH0428099B2 (enrdf_load_stackoverflow)
JP3983278B2 (ja) 露光方法および露光装置
US5237393A (en) Reticle for a reduced projection exposure apparatus
KR100250155B1 (ko) 노광장치
JP3180004B2 (ja) 露光フィルムの整合方法及び整合装置
JPH0147007B2 (enrdf_load_stackoverflow)
JP2001022098A (ja) 露光装置におけるアライメント装置、被露光基板、及びアライメントマーク
JP2005003965A (ja) 露光装置
JPH10312049A (ja) レチクル
TWI528104B (zh) 光罩
JPH11133588A (ja) 露光マスクおよび露光装置
SU884179A1 (ru) Устройство дл контрол фотошаблонов
JPS62183518A (ja) 露光装置
JPH0235445B2 (enrdf_load_stackoverflow)
JP3413947B2 (ja) 周辺露光装置
JP3381334B2 (ja) 投影露光装置
JP2545431B2 (ja) リソグラフィ―用レチクルおよびレチクルパタ―ン転写方法
JPH0458169B2 (enrdf_load_stackoverflow)
JPH0630334B2 (ja) 露光方法